| [1] International Technology Roadmap for Semiconductor(ITRS 2009), 2010. [2] CONLEY W, BENDIK J. Is ArF the final wavelength[J]. Proc SPIE, 2004, 5376:16-20. [3] 巩岩, 张巍. 光刻曝光系统的现状及发展[J]. 中国光学, 2008, 1(1):25-35. GONG Y, ZHANG W. Present status and progress in 193 nm exposure[J]. Chinese Optics, 2008, 1(1):25-35.(in Chinese) [4] 吴兆喜, 黄元庆. 基于光学原理的三维形貌测量技术研究[J]. 光学技术, 2006, 32:654-658. WU ZH X, HUANG Y Q. Study on optical methods for 3-D shape measurement[J]. Opt. Technique, 2006, 32:654-658.(in Chinese) [5] 王佳, 赵洋, 张书练, 等. 纳米计量学与纳米计量测试技术(一)[J]. 航空计测技术, 1995, 15(5):3-5. WANG J, ZHAO Y, ZHANG SH L, et al.. Nano metrology and nano metrology testing technology(1)[J]. Aviation Metrology & Measurement Technology, 1995, 15(5):3-5.(in Chinese) [6] 张立超, 高劲松. 长春光机所深紫外光学薄膜技术研究进展量[J]. 光学 精密工程, 2011, 11(20):2395-2401. ZHANG L CH, GAO J S. Developments of DUV coating technology in CIOM[J]. Opt. Precision Eng., 2011, 11(20):2395-2401.(in Chinese) [7] FUKUDA K, ITO T, KOBAYASHI M. Nano indentation of the resist for electron beam lithography[J]. JSME Annual Meeting, 2003(4):105-106. [8] 王淑珍, 谢铁邦, 常素萍. 复合型超精密表面形貌测量仪[J]. 光学 精密工程, 2011, 19(4):828-835. WANG SH ZH, XIE T B, CHANG S P. Combined profilometer for ultra-precision surface topography[J]. Opt. Precision Eng., 2011, 19(4):828-835. [9] LIU S, NAGASAWA S, TAKAHASHI S, et al.. Development of a multi-ball-cantilever AFM for measuring resist surface[J]. J. Robotics and Mechatronics, 2006, 18(6):698-704. [10] ZYGO C. NewView Accessories. Product guide for the NewView 3D Surface Profiler, 2001. |