离子束溅射制备GdF<sub>3</sub>光学薄膜沉积速率分布特性

贺健康; 张立超; 才玺坤; 时光; 武潇野; 梅林; 贺健康; 张立超; 才玺坤; 时光; 武潇野; 梅林

doi:10.3788/CO.20160903.0356

[1]

薛春荣,范正修,邵建达.真空紫外光学薄膜及薄膜材料[J].激光与光电子学进展,2008,45(1):57-64.

XUE CH R,FAN ZH X,SHAO J D. Vaccum ultraviolet optical coatings and film materials[J]. Laser & Optoelectronics Progress,2008,45(1):57-64.(in Chinese)

[2]

张立超,才玺坤,时光. 深紫外光刻光学薄膜[J].中国光学,2015,8(2):.

ZHANG L CH,CAI X K,SHI G. Optical coating for DUV lithography[J]. Chinese Optics,2015,8(2):.(in Chinese)

[3]

张立超,高劲松.长春光机所深紫外光学薄膜技术研究进展[J].光学精密工程,2012,20(11):2395-2401.

ZHANG L CH,GAO J S. Developments of DUV coating technologies in CIOMP[J]. Opt. Precision Eng.,2012,20(11):2395-2401.(in Chinese)

[4]

才玺坤,张立超,梅林,等.热蒸发和离子束溅射制备LaF₃薄膜的光学特性[J].中国光学,2014,.

CAI X K,ZHANG L CH,MEI L,et al.. Optical properties of LaF₃ thin films prepared by thermalevaporation and ion beam sputtering[J]. Chinese Optics,2014,.

[5]

DETLEV R. Ion beam sputter coating for laser technology[J]. SPIE,2005,5963:1-12.

[6]

SVETLANA D,MARK G,ANATOLI C. Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using a ion-beam sputtering system with a customized planetary rotation stage[J]. SPIE,2011,8168:1-8

[7]

唐晋法,顾培夫,刘旭,等.现代光学薄膜技术[M].杭州:浙江大学出版社,2006.

TANG J F,GU P F,LIU X,et al.. Modern Optical Thin Film Technology[M]. Hangzhou:Zhejiang University Press,2006.(in Chinese)

[8]

董磊,赵元安,易葵,等.不同类型蒸发源对平面夹具薄膜均匀性的影响[J].强激光与粒子束,2005,17(10):1515-1522.

DONG L,ZHAO Y A,YI K,et al.. Influence of different kinds of evaporation sources on films uniformity[J]. High Power Laser and Particle Beams,2005,17(10):1515-1522.(in Chinese)

[9]

潘栋梁,熊胜明,张云洞,等.行星夹具膜厚均匀性计算[J].强激光与粒子束,2000,12(3):277-280.

PAN D L,XIONG SH M,ZHANG Y D,et al.. Film uniformity calculation of large caliber coating machine[J]. High Power Laser and Particle Beams,2000,12(3):277-280.(in Chinese)

[10]

张立超,高劲松.基于遮挡矩阵的膜厚修正挡板的设计[J].光学精密工程,2013,21(11):2757-2763.

ZHANG L CH,GAO J S. Design of uniformity correction masks based on shadow matrix[J]. Opt. Precision Eng.,2013,3676:724-734.(in Chinese)

[11]

张以忱,等.真空镀膜技术[M].北京:冶金工业出版社,2009.

ZHANG Y SH,et al.. Vacuum Coating Technology[M]. Beijing: Metallurgical Industry Press,2009.(in Chinese)

[12]

GROSS M,DLIGATCH S,CHTANOV A. Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method[J]. Applied Optics,2011,50(9):C316-C320.

[13]

汤雪飞,范修正,王之江.离子束溅射沉积光学薄膜速率分布[J].中国激光,1992,A20(5):345-348.

TANG X F,FAN ZH X,WANG ZH J. Optical coating deposition rate distribution by ion beam sputtering[J]. Chinese J. Lasers,1992,A20(5):345-348.(in Chinese)

[14]

AKIO F. Calculation of thickness distribution for ion beam sputter deposition[J]. J. Vac. Sci. Technol.,1991,A 9(1):141.

[15]

刘金声.离子束沉积薄膜技术及应用[M].北京:国防工业出版社,2003.

LIU J SH. Ion Beam Deposition Film Technology and Application[M]. Beijing:National Defence of Industry Press,2003.(in Chinese)

[16]

盛骤,谢式千,潘承毅.概率论与数理统计[M].北京:高等教育出版社,2005.

SHENG ZH,XIE SH Q,PAN CH Y,et al.. Probability Theory & Mathematical Statistics[M]. Beijing:Higher Education Press,2005.(in Chinese)

[17]

邹斯勤,靖大为.累计量算法原理及应用[J].华北电力技术,1985.

ZOU S Q,JING D W. Cumulant algorithm principle and application[J]. North China Electric Power,1985,3(3):1-12(in Chinese)