[1] LIU C C,LEE C C,KANEKO M,et al.. Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat[J]. Applied Optics,2006,45(7):1368-1374. doi: 10.1364/AO.45.001368
[2] 时光,梅林,张立超.球面元件表面AlF3薄膜的光学特性和微观结构表征[J].中国光学,2013,6(6):906-911. http://www.chineseoptics.net.cn/CN/abstract/abstract9088.shtml

SHI G,MEI L,ZHANG L CH. Characterization of optical and microstructural properties ofAlF3 thin films deposited on spherical element[J]. Chinese Optics,2013,6(6):906-911.(in Chinese) http://www.chineseoptics.net.cn/CN/abstract/abstract9088.shtml
[3] ZHANG L C,CAI X K. High performance fluoride optical coatings for DUV optics[J]. SPIE,2014,9281:92810A. http://cn.bing.com/academic/profile?id=2061322383&encoded=0&v=paper_preview&mkt=zh-cn
[4] LAUX S,BERNITZKI H,FASOLD D,et al.. Low-loss HR coatings on fused silica substrates for 193 nm micro-lithography applications[J]. SPIE,2008,7101:71010Y. http://cn.bing.com/academic/profile?id=1982047633&encoded=0&v=paper_preview&mkt=zh-cn
[5] ULLMANN J,KERK H G,THIELSCH R,et al.. Mechanical stress in fluoride coatings[J]. SPIE,1999,3738:136-147. http://cn.bing.com/academic/profile?id=2123323099&encoded=0&v=paper_preview&mkt=zh-cn
[6] GUNSTER S,DIECKMANN M,EHLERS H,et al.. Stress compensation in fluoride coatings for the VUV spectral range[J]. Optical Interference Coatings,2007,TuB5. http://cn.bing.com/academic/profile?id=2326024092&encoded=0&v=paper_preview&mkt=zh-cn
[7] YOSHIDA T,NISHIMOTO K,SEKINE K,et al.. Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering[J]. Applied Optics,2006,45(7):1375-1379. doi: 10.1364/AO.45.001375
[8] 才玺坤,张立超,梅林,等.热蒸发与离子束溅射制备LaF3薄膜的光学特性[J].中国光学,2014,7(5):808-815. http://www.chineseoptics.net.cn/CN/abstract/abstract9171.shtml

CAI X K,ZHANG L CH,MEI L,et al.. Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics,2014,7(5):808-815.(in Chinese) http://www.chineseoptics.net.cn/CN/abstract/abstract9171.shtml
[9] ODE A. Ion beam sputtering of fluoride thin films for 193 nm applications[J]. Applied Optics,2014,53(4):A330-A333. doi: 10.1364/AO.53.00A330
[10] 张立超,高劲松.长春光机所深紫外光学薄膜技术研究进展[J].光学精密工程,2012,20(11):2395-2401. doi: 10.3788/OPE.

ZHANG L C,GAO J S. Developments of DUV coating technologies in CIOMP[J]. Opt. Precision Eng.,2012,20(11):2395-2401.(in Chinese) doi: 10.3788/OPE.
[11] 张金胜,张金龙,宁永强.离子辅助沉积法制备SiO2介质薄膜的应力研究[J].发光学报,2012,33(12):1304-1308. doi: 10.3788/fgxb

ZHANG J SH,ZHANG J L,NING Y Q. Study of SiO2 dielectric film stress grown by the method of ion assisted deposition[J]. Chinese J. Luminescence,2012,33(12):1304-1308.(in Chinese) doi: 10.3788/fgxb
[12] 刘华松,王利栓,姜玉刚,等.离子束溅射制备SiO2薄膜折射率与应力调整[J].光学精密工程,2013,21(9):2238-2243. doi: 10.3788/OPE.

LIU H S,WANG L S,JIANG Y G,et al.. Adjustments of refractive index and stress of SiO2 films prepared by IBS technology[J]. Opt. Precision Eng.,2013,21(9):2238-2243.(in Chinese) doi: 10.3788/OPE.
[13] 刘华松,姜承慧,王利栓,等.热处理对离子束溅射Ta2O5薄膜特性的影响[J].光学精密工程,2014,22(10):2645-2651. doi: 10.3788/OPE.

LIU H S,JIANG CH H,WANG L SH,et al.. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Opt. Precision Eng.,2014,22(10):2645-2651.(in Chinese) doi: 10.3788/OPE.
[14] OHRING M. Materials Science of Thin Films(Second Edition)[M]. Heidelbery:Academic Press,2001.
[15] LYNGNES O,KRAUS K,ODE A,et al.. Method for designing coating thickness uniformity shadow masks for deposition systems with a planetary fixture[C]. Society of Vacuum Coaters,2014 Technical Conference Proceedings,optical coating,2014:1817.