| Citation: | WANG Xin-yu, LI Wen-hao, WANG Wei, LIU Zhao-wu, JIANG Shan, ZHOU Wen-yuan, Bayanheshig. Error modeling and analysis of dual-frequency laser interferometry in scanning beam interference lithography system[J]. Chinese Optics. doi: 10.37188/CO.2024-0149
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Scanning interference field exposure (SBIL) is an effective way to fabricate monomeric large-area high-precision gratings. Using dual-frequency laser interferometer feedback table position to splicing interference fringes accurately, the measurement error will inevitably introduce grating engraving error and reduce the diffraction wavefront quality of grating. The intrinsic error caused by the structure of laser interferometer is analyzed, and the evaluation method of the intrinsic error index of laser interferometer in complex environment is proposed. The theoretical models of dead path error and measuring optical path variation error combined with actual working conditions and empirical formulas are established. By constructing translation and rotation operators, the coupling relationship between rotation and displacement of any point of the table is deduced, and the measurement errors under different table attitude roll angles are simulated. The displacement error experiment and grating scanning exposure experiment are carried out. The experimental results show that the displacement error is consistent with the theoretical calculation results. The diffraction wavefront of the 200 mm×200 mm grating is 0.278λ@632.8nm. The analytical method in this paper connects the transmission link between the grating diffraction wavefront and the measurement error, and lays a theoretical and experimental foundation for the fabrication of meter-size nano-precision holographic gratings.
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