| Citation: | YIN Hui-ping, LI Wen-di, FENG Xiao-xiao, QIN Fei-fei, SHI Zheng, WANG Yong-jin, LI Xin. Loss characteristics analysis and process optimization of gallium nitride optical waveguide[J]. Chinese Optics. doi: 10.37188/CO.2024-0188
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This study investigates the transmission loss characteristics of gallium nitride (GaN) planar optical waveguides using a finite element simulation model based on the Beam Propagation Method (BPM). To address the high transmission loss in conventional GaN waveguides, we propose process optimization solutions and develop a comprehensive transmission loss model for systematic analysis. Our investigation focuses on comparing the effects of top etching and back thinning processes on waveguide optimization. Both processes significantly reduce the waveguide transmission loss, with the top etching process reducing loss from 2.29 dB/mm to 0.19 dB/mm and the back thinning process reducing it to 0.24 dB/mm. Additionally, we analyze the impact of manufacturing defects, such as sidewall angles and surface roughness, on transmission loss. Through parameter optimization, we identify the key dimensions necessary for single mode light transmission. This study provides a theoretical basis and process guidance for the development of low-loss GaN waveguides.
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