| Citation: | ZHANG Bo-bo, E Ke-wei, LI Shi-jie, LI Jing, LIU Huan-yu, GUO Yong-kang, ZHANG Dong-xu, XUE Xun, ZHAO Jian-ke. Research on data processing for Ritchey-Common test based on sensitivity matrix[J]. Chinese Optics. doi: 10.37188/CO.2025-0017
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To address the limitations of conventional data processing approaches in Ritchey-Common method-based inspection of large-aperture planar mirrors, particularly their restricted applicability and environmental sensitivity, this study presents a novel hybrid analytical methodology integrating sensitivity matrix decomposition with rigorous ray tracing simulations. The proposed framework establishes a comprehensive solution for high-precision surface figure characterization through systematic error decoupling and numerical optimization. The investigation commences with the development of a Zemax-based Ritchey-Common optical model, from which a sensitivity matrix is rigorously derived through advanced ray tracing algorithms. This matrix enables precise separation of systematic errors inherent in the measurement process, demonstrating superior accuracy compared to conventional Zernike polynomial aberration correction methods while eliminating approximation-induced artifacts in data interpretation. Subsequent numerical verification of the sensitivity matrix algorithm confirms its theoretical validity and computational robustness. Experimental validation encompasses dual-scale implementation: Primary verification employs a 200-mm aperture test mirror, where cross-comparative analysis with direct interferometric measurements achieves sub-wavelength consistency (RMS < λ/40). Full-scale application in the manufacturing process of a 2.2-meter class planar mirror demonstrates exceptional surface figure control, attaining final surface accuracy better than λ/50 RMS. The methodology exhibits significant improvements in measurement repeatability and environmental stability. This research establishes a generalized computational framework that effectively addresses the scalability challenges in ultra-precision optical testing, providing both theoretical advancement and practical engineering solutions for next-generation large-aperture optical systems fabrication.
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