Citation: | WANG Ke, LIU Yang, WANG Yun-zhe, ZHANG Yin, WANG Zhen-zhou, SHAO Jun-feng. Investigation of laser-induced damage mechanisms in back-illuminated cmos detector modules under nanosecond pulsed irradiation[J]. Chinese Optics. doi: 10.37188/CO.2025-0090 |
To evaluate the laser-induced damage effects on visible-light imaging systems under realistic operational conditions, a detector module comprising a filter and a back-illuminated CMOS sensor was employed as the target. This study investigates the damage mechanisms induced by nanosecond pulsed lasers at wavelengths of 532 nm and
[1] |
KHATIRI M, PANAHPOUR A, RAZAGHI H, et al. Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes[J]. Indian Journal of Physics, 2021, 95(4): 639-645. doi: 10.1007/s12648-020-01725-3
|
[2] |
崔云, 张革, 赵元安, 等. 激光薄膜元件内微缺陷的表征分析[J]. 中国激光,2023,50(2):0203101. doi: 10.3788/CJL220568
CUI Y, ZHANG G, ZHAO Y A, et al. Characterization analysis of micro-defects in thin-film components for laser systems[J]. Chinese Journal of Lasers, 2023, 50(2): 0203101. (in Chinese). doi: 10.3788/CJL220568
|
[3] |
向程江, 刘晓凤, 陶春先, 等. 1064 nm纳秒激光辐照下HfO2/SiO2增透膜损伤的动态过程研究[J]. 中国激光,2024,51(8):0803101. doi: 10.3788/CJL231071
XIANG CH J, LIU X F, TAO CH X, et al. Dynamic damage process of HfO2/SiO2 anti-reflection coatings under 1064 nm nanosecond laser irradiation[J]. Chinese Journal of Lasers, 2024, 51(8): 0803101. (in Chinese). doi: 10.3788/CJL231071
|
[4] |
玛丽娅, 李豫东, 郭旗, 等. CMOS有源像素图像传感器的电子辐照损伤效应研究[J]. 发光学报,2017,38(2):182-187. doi: 10.3788/fgxb20173802.0182
MA L Y, LI Y D, GUO Q, et al. Electron beam radiation effects on CMOS active pixel sensor[J]. Chinese Journal of Luminescence, 2017, 38(2): 182-187. (in Chinese). doi: 10.3788/fgxb20173802.0182
|
[5] |
韩敏, 聂劲松, 豆贤安, 等. 基于激光不同加载方式下CCD损伤特性的时间演化规律[J]. 发光学报,2019,40(6):788-794. doi: 10.3788/fgxb20194006.0788
HAN M, NIE J S, DOU X A, et al. Temporal evolution characteristics of CCD detector based on different laser loading methods[J]. Chinese Journal of Luminescence, 2019, 40(6): 788-794. (in Chinese). doi: 10.3788/fgxb20194006.0788
|
[6] |
WESTGATE C, JAMES D. Visible-band nanosecond pulsed laser damage thresholds of silicon 2D imaging arrays[J]. Sensors, 2022, 22(7): 2526. doi: 10.3390/s22072526
|
[7] |
THÉBERGE F, AUCLAIR M, DAIGLE J F, et al. Damage thresholds of silicon-based cameras for in-band and out-of-band laser expositions[J]. Applied Optics, 2022, 61(10): 2473-2482. doi: 10.1364/AO.450317
|
[8] |
朱孟真, 刘云, 米朝伟, 等. 复合激光损伤CMOS图像传感器实验研究[J]. 红外与激光工程,2022,51(7):20210537. doi: 10.3788/IRLA20210537
ZHU M ZH, LIU Y, MI CH W, et al. Experimental study on a CMOS image sensor damaged by a composite laser[J]. Infrared and Laser Engineering, 2022, 51(7): 20210537. (in Chinese). doi: 10.3788/IRLA20210537
|
[9] |
WANG Y ZH, ZHANG Y F, LIU Y, et al. Investigation on interference effects of CCD detectors by 1064 nm pulsed/continuous lasers[J]. Optics Express, 2025, 33(5): 9383-9399. doi: 10.1364/OE.552013
|
[10] |
WANG Y ZH, CHENG X ZH, SHAO J F, et al. The damage threshold of multilayer film induced by femtosecond and picosecond laser pulses[J]. Coatings, 2022, 12(2): 251. doi: 10.3390/coatings12020251
|
[11] |
LIU Y, ZHOU F, WANG Y ZH, et al. Experimental study on damage effect of mid-infrared pulsed laser on charge coupled device (CCD) and HgCgTe detectors[J]. Sensors, 2024, 24(13): 4380. doi: 10.3390/s24134380
|
[12] |
王云哲, 张鲁薇, 邵俊峰, 等. 脉冲激光对石英基底Ta2O5/SiO2滤光膜的损伤效应研究[J]. 红外与激光工程,2023,52(3):20220482. doi: 10.3788/IRLA20220482
WANG Y ZH, ZHANG L W, SHAO J F, et al. Damage effect of pulsed laser on Ta2O5/SiO2 filter film on quartz substrate[J]. Infrared and Laser Engineering, 2023, 52(3): 20220482. (in Chinese). doi: 10.3788/IRLA20220482
|
[13] |
QIU P, ZHAO Y, ZHENG J, et al. Research on performances of back-illuminated scientific CMOS for astronomical observations[J]. Research in Astronomy and Astrophysics, 2021, 21(10): 268-278.
|
[14] |
ZHANG Y, CHEN M, LI X, et al. Comprehensive review on laser damage mechanisms and thresholds of optical sensors[J]. Progress in Quantum Electronics, 2021, 75: 100304. (查阅网上资料, 未找到本条文献信息, 请确认).
|
[15] |
International Organization for Standardization. ISO 21254-1: 2011 Lasers and laser-related equipment—test methods for laser-induced damage threshold—part 1: definitions and general principles[S]. Geneva: ISO, 2011.
|
[16] |
BERGMAN T L, LAVINE A S, INCROPERA F P, et al. Fundamentals of Heat and Mass Transfer[M]. 8th ed. New York: Wiley Press, 2017.
|
[17] |
ZHANG H X, LI Y F, CHANG H, et al. Investigation of the damage profiles and mechanisms of CMOS devices subjected to continuous and pulsed laser exposure[J]. Applied Physics B, 2025, 131(4): 93. doi: 10.1007/s00340-025-08427-w
|
[18] |
BI W J, ZHANG Y C, LIU Q, et al. Failure mechanisms of a silicon-based CMOS image sensors under 1550 nm nanosecond laser[J]. Optical Express, 2024, 32(2): 1234-1250. (查阅网上资料, 未找到本条文献信息, 请确认).
|
[19] |
SCHWARZ B, RITT G, KOERBER M, et al. Laser-induced damage threshold of camera sensors and micro-optoelectromechanical systems[J]. Optical Engineering, 2017, 56(3): 034108. doi: 10.1117/1.OE.56.3.034108
|