Turn off MathJax
Article Contents
FU Meng-jie, DONG Hai-liang, JIA Zhi-gang, JIA Wei, LIANG Jian, XU Bing-she. Effect of GaInP and GaAsP inserted into waveguide/barrier interface on carrier leakage in InAlGaAs quantum well 808 nm laser diode[J]. Chinese Optics. doi: 10.37188/CO.EN-2024-0006
Citation: FU Meng-jie, DONG Hai-liang, JIA Zhi-gang, JIA Wei, LIANG Jian, XU Bing-she. Effect of GaInP and GaAsP inserted into waveguide/barrier interface on carrier leakage in InAlGaAs quantum well 808 nm laser diode[J]. Chinese Optics. doi: 10.37188/CO.EN-2024-0006

Effect of GaInP and GaAsP inserted into waveguide/barrier interface on carrier leakage in InAlGaAs quantum well 808 nm laser diode

cstr: 32171.14.CO.EN-2024-0006
Funds:  Supported by National Natural Science Foundation of China (No. 61904120, No. 21972103); Shanxi “1331 project” and the Shanxi-Zheda Institute of Advanced Materials and Chemical Engineering (No. 2022SX-TD018, No. 2021SX-AT001, 002 and 003)
More Information
  • Author Bio:

    FU Meng-jie (1996—), female, born in Shangqiu, Henan Province. She received her bachelor's degree from Henan University of Urban Construction in 2020, and is now a master's candidate in the School of Taiyuan University of Technology. She is mainly engaged in the research of design of epitaxial structure for 808 nm LD. E-mail: 2227240245@qq.com

    DONG Hai-liang, M. S. Supervisor. Received his B. S. degree from Ludong University in 2008, M. S. degree from Taiyuan University of Technology in 2011, and Ph. D. degree from Taiyuan University of Technology in 2016; Since 2019, he has been working as a senior experiment in the Key Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology; His main research work is GaAs and GaN based semiconductor lasers, the Light-emitting device structure design, epitaxial material growth and performance characterization. E-mail: dhltyut@163.com

    Mr. Xu Bingshe, Professor and Doctoral Supervisor, received his Bachelor's Degree from Taiyuan University of Technology in 1978, and his Doctoral Degree from the University of Tokyo in 1994. He has presided and currently is working on more than 50 national and provincial projects, such as the National Outstanding Young Scientist Fund, the National 973 Program, the International Science and Technology Cooperation Program of the Ministry of Science and Technology, the Major Research Program of the National Natural Science Foundation of China (Nano Special Project), the National Natural Science Foundation of China, and the Sino-Japanese International Cooperation Program of the National Natural Science Foundation of China, and so on. His research interests include nano and thin film functional materials and their devices. He has published more than 450 papers in Advanced Functional Materials, Angewandte Chemie, Acta Materialia, and other national and international journals. E-mail: xubs@tyut.edu.cn

  • Corresponding author: dhltyut@163.comxubs@tyut.edu.cn
  • Received Date: 27 Feb 2024
  • Accepted Date: 06 May 2024
  • Available Online: 17 May 2024
  • There is nonradiative recombination in waveguide region owing to carrier leakage, which in turn reduces output power and wall-plug efficiency. In this paper, we designed a novel epitaxial structure, which suppresses carrier leakage by inserting n-Ga0.55In0.45P and p-GaAs0.6P0.4 between barriers and waveguide layers, respectively, to modulate the energy band structure and to increase the height of barriers. The results showed that leakage current density reduced by 87.71%, compared to traditional structure. The nonradiative recombination current density of novel structure reduced to 37.411 A/cm2, and output power reached 12.80 W with wall-plug efficiency of 78.24% at an injection current density 5 A/cm2 at room temperature. In addition, temperature drift coefficient of center wavelength was 0.206 nm/°C at the temperature range from 5 to 65 °C, and the slope of fitted straight line of threshold current with temperature variation was 0.00113. The novel epitaxial structure provides a theoretical basis for achieving high-power laser diode.

     

  • loading
  • [1]
    CRUMP P, ERBERT G, WENZEL H, et al. Efficient high-power laser diodes[J]. IEEE Journal of Selected Topics in Quantum Electronics, 2013, 19(4): 1501211. doi: 10.1109/JSTQE.2013.2239961
    [2]
    KAUSHAL H, KADDOUM G. Applications of lasers for tactical military operations[J]. IEEE Access, 2017, 5: 20736-20753. doi: 10.1109/ACCESS.2017.2755678
    [3]
    LI X Y, JIANG K, ZHU ZH, et al. High-brightness 808 nm semiconductor laser diode packaged by SiC heat sink[J]. Journal of Modern Optics, 2020, 67(11): 1017-1021. doi: 10.1080/09500340.2020.1810339
    [4]
    REHIOUI O, BECHOU L, FILLARDET T, et al. Degradation analysis of individual emitters in 808nm QCW laser diode array for space applications[J]. Proceedings of SPIE, 2010, 7583: 758314. doi: 10.1117/12.840671
    [5]
    WANG B G, TAN SH Y, ZHOU L, et al. High reliability 808nm laser diodes with output power over 19W under CW operation[J]. IEEE Photonics Technology Letters, 2022, 34(6): 349-352. doi: 10.1109/LPT.2022.3156913
    [6]
    FREVERT C, CRUMP P, BUGGE F, et al. The impact of low Al-content waveguides on power and efficiency of 9xx nm diode lasers between 200 and 300 K[J]. Semiconductor Science and Technology, 2016, 31(2): 025003. doi: 10.1088/0268-1242/31/2/025003
    [7]
    ZHANG B, WANG H ZH, WANG X, et al. Effect of GaAs insertion layer on the properties improvement of InGaAs/AlGaAs multiple quantum wells grown by metal-organic chemical vapor deposition[J]. Journal of Alloys and Compounds, 2021, 872: 159470. doi: 10.1016/j.jallcom.2021.159470
    [8]
    CAO Y L, LIAN P, MA W Q, et al. Influence of GaAsP insertion layers on performance of InGaAsP/InGaP/AlGaAs quantum-well laser[J]. Chinese Physics Letters, 2006, 23(9): 2583-2586. doi: 10.1088/0256-307X/23/9/065
    [9]
    LI X, ZHAO D G, JIANG D SH, et al. Suppression of electron leakage in 808 nm laser diodes with asymmetric waveguide layer[J]. Journal of Semiconductors, 2016, 37(1): 014007. doi: 10.1088/1674-4926/37/1/014007
    [10]
    ASRYAN L V, ZUBOV F I, KRYZHANOVSKAYA N V, et al. Lasers with asymmetric barrier layers: a promising type of injection lasers[J]. Journal of Physics: Conference Series, 2016, 741: 012111. doi: 10.1088/1742-6596/741/1/012111
    [11]
    ZUBOV F I, MURETOVA M E, ASRYAN L V, et al. Feasibility study for Al-free 808 nm lasers with asymmetric barriers suppressing waveguide recombination[J]. Journal of Applied Physics, 2018, 124(13): 133105. doi: 10.1063/1.5039442
    [12]
    ZHANG X, DONG H L, JIA ZH G, et al. Effect of Ga1−xInxAs1−yPy Al-free asymmetric barrier on GaAs-based 808-nm laser diode[J]. Optics Letters, 2022, 47(5): 1153-1156. (查阅网上资料, 未能确认作者信息, 请确认) .
    [13]
    YUAN Q H, JING H Q, ZHONG L, et al. High-power and high-reliability 9XX-nm laser diode[J]. Chinese Journal of Lasers, 2020, 47(4): 0401006. (in Chinese). doi: 10.3788/CJL202047.0401006
    [14]
    ZHANG J, NING Y Q, ZENG Y G, et al. Design and analysis of high-temperature operating 795 nm VCSELs for chip-scale atomic clocks[J]. Laser Physics Letters, 2013, 10(4): 045802. doi: 10.1088/1612-2011/10/4/045802
    [15]
    ZHANG Y, NING Y Q, ZHANG L S, et al. Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs[J]. Optics Express, 2011, 19(13): 12569-12581. doi: 10.1364/OE.19.012569
    [16]
    LAN Y, YANG G W, LIU Y X, et al. 808 nm broad-area laser diodes designed for high efficiency at high-temperature operation[J]. Semiconductor Science and Technology, 2021, 36(10): 105012. doi: 10.1088/1361-6641/ac2160
    [17]
    SLIPCHENKO S O, VINOKUROV D A, PIKHTIN N A, et al. Ultralow internal optical loss in separate-confinement quantum-well laser heterostructures[J]. Semiconductors, 2004, 38(12): 1430-1439. doi: 10.1134/1.1836066
    [18]
    LIU Y X, YANG G W, ZHAO Y M, et al. 48 W continuous-wave output from a high-efficiency single emitter laser diode at 915 nm[J]. IEEE Photonics Technology Letters, 2022, 34(22): 1218-1221. doi: 10.1109/LPT.2022.3207786
    [19]
    MAN Y X, ZHONG L, MA X Y, et al. 975 nm semiconductor lasers with ultra-low internal optical loss[J]. Acta Optica Sinica, 2020, 40(19): 1914001. (in Chinese). doi: 10.3788/AOS202040.1914001
    [20]
    AVRUTIN E A, RYVKIN B S, KOSTAMOVAARA J T. AlGaAs/GaAs asymmetric-waveguide, short cavity laser diode design with a bulk active layer near the p-cladding for high pulsed power emission[J]. IET Optoelectronics, 2021, 15(4): 194-199. doi: 10.1049/ote2.12033
    [21]
    RYVKIN B S, AVRUTIN E A. Asymmetric, nonbroadened large optical cavity waveguide structures for high-power long-wavelength semiconductor lasers[J]. Journal of Applied Physics, 2005, 97(12): 123103. doi: 10.1063/1.1928309
    [22]
    ZUBOV F I, MURETOVA M E, PAYUSOV A S, et al. Parasitic recombination in a laser with asymmetric barrier layers[J]. Semiconductors, 2020, 54(3): 366-373. doi: 10.1134/S1063782620030203
    [23]
    ZHANG X L, DONG H L, ZHANG X, et al. Reduction of nonradiative recombination for high-power 808 nm laser diode adopting InGaAsP/InGaAsP/GaAsP active region[J]. Optics Communications, 2023, 537: 129461. doi: 10.1016/j.optcom.2023.129461
    [24]
    KHALFIN V B, GULAKOV A B, KOCHNEV I V, et al. The influence of leakage on the characteristics of QW lasers[J]. AIP Conference Proceedings, 1991, 240(1): 49-57.
    [25]
    KAIFUCHI Y, YOSHIDA K, YAMAGATA Y, et al. Enhanced power conversion efficiency in 900-nm range single emitter broad stripe laser diodes maintaining high power operability[J]. Proceedings of SPIE, 2019, 10900: 109000F.
    [26]
    XU B SH, QU K, WANG ZH Y, et al. Investigation of photoelectric performance of laser diode by regulation of p-waveguide layer thickness[J]. Optik, 2020, 200: 163458. doi: 10.1016/j.ijleo.2019.163458
    [27]
    WU SH H, LI T, WANG ZH F, et al. Study of temperature effects on the design of active region for 808 nm high-power semiconductor laser[J]. Crystals, 2023, 13(1): 85-99. doi: 10.3390/cryst13010085
    [28]
    WENZEL H, ERBERT G, BUGGE F, et al. Optimization of GaAsP-QWs for high-power diode lasers at 800 nm[J]. Proceedings of SPIE, 2000, 3947: 32-38. doi: 10.1117/12.382104
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Figures(7)  / Tables(1)

    Article views(128) PDF downloads(13) Cited by()
    Proportional views
    Related

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return