Citation: | DOU Yin-ping, SUN Chang-kai, LIN Jing-quan. Laser-produced plasma light source for extreme ultraviolet lithography[J]. Chinese Optics, 2013, 6(1): 20-33. doi: 10.3788/CO.20130601.0020 |
[1] 张福昌,李艳秋. EUV光刻中激光等离子体光源的发展[J]. 微细加工技术,2006(5):1-7. ZHANG F CH,LI Y Q. Development of laser produced plasma source for EUV lithograghy[J]. Microfabrication Technology,2006(5):1-7.(in Chinese)
[2] 王占山. 极紫外光刻给光学技术带来的挑战[J]. 红外与激光工程,2006(增2):151-156. WANG ZH SH. Extreme ultraviolet lithograghy chanlleges to optical technology[J]. Infrared and Laser Eng.,2006(Supl2):151-156.(in Chinese)
[3] PARKER A. Extreme ultraviolet lithography imaging the future. lawrence livermore national laboratory[EB/OL].(1999-11-01).[2012-07-11].http://www.11n1.gov/str/sween.htm.
[4] Industry defining EUV source[EB/OL].[2012-07-11].http://www.cymer.com/hvm_1.
[5] BAJT S,ALAMEDA J,AND SPILLER E. Improved reflectance and stability of Mo/Si multilayers[J]. SPIE,2001,4506:65-246.
[6] International Workshops on EUV Sources,2010 [C]//International workshops on EUV source,Dublin,Ireland,Nov.13-15,2010.
[7] MIZOGUCHI H,ABE H,ISHIHARA T,et al.. First generation laser-produced plasma source system for HVM EUV lithography[J]. SPIE,2010,7636:763608.
[8] FOMENKOV I V,BRANDT D C,BYKANOV N B,et al.. Laser-produced plasma light source for EUVL[J]. SPIE,2010,7271:727138.
[9] ASML lithography roadmap[EB/OL].[2012-07-11].http://www.asml.com.
[10] SHIMOURA A,AMANO S,MIYAMOTO S,et al.. X-ray generation in cryogenic targets irradiated by 1 μm pulse laser[J]. Appl. Phys. Lett.,1998,72:164-166.
[11] SCHRIEVER G,MAGER S,NAWEED A,et al.. Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy[J]. Appl. Opt.,1998,37:1243-1248.
[12] SHIMADA Y,NISHIMURA H,NAKAI M,et al.. Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams[J]. Appl. Phys. Lett.,2005,86:105-501.
[13] UENO Y,SOUMAGNE G,SUMITANI A,et al.. Enhancement of extreme ultraviolet emission from a CO2 laser-produced sn plasma using a cavity target[J]. Appl. Phys. Lett.,2007,91:231501.
[14] HARILAL S S,TILLACK M S,O'SHAY B,et al.. Extreme ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets[J]. Opt. Lett.,2006,31:1549-1551.
[15] O'SULLIVAN G D,CUMMINGS A,DUFFY G,et al.. Optimizing an EUV source for 13.5 nm[J]. SPIE, 2004,5196:273-281.
[16] TOSHIHISA T,TATSUYA A,YOSHIFUMI U,et al.. Use of tin as a plasma source material for high conversion efficiency[J]. SPIE,2003,5037:147-155.
[17] TAO Y,NISHIMURA H,OKUNO T,et al.. Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-production Sn plasmas[J]. Appl. Phys. Lett.,2005,87:241502.
[18] JANSSON P A C,HANSSON B A M,HEMBERG O,et al.. Liquid-tin-jet laser-plasma extreme ultraviolet generation[J]. Appl. Phys. Lett.,2004,84:2256-2258.
[19] KAKU M,SUETAKE S,SENBA Y,et al.. Deposited debris characteristics and its reduction of a laser-produced plasma extreme ultraviolet source using a colloidal tin dioxide jet target[J]. Appl. Phys. Lett.,2008,92:181503.
[20] WHITE J,DUNNE P,HAYDEN P,et al.. Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength[J]. Appl. Phys. Lett.,2007,90:181502.
[21] ANDO T,FUJIOKA S,NISHIMURA H,et al.. Optimum laser pulse duration for efficient extreme ultraviolet light generation from laser-produced tin plasmas[J]. Appl. Phys. Lett.,2006,89:151501.
[22] HARILAL S S,COONS R W,HOUGH P,et al.. Influence of spot size on extreme ultraviolet efficiency of laser-produced Sn plasmas[J]. Appl. Phys. Lett.,2009,95:221501.
[23] LETARDI T,LO D,ZHENG C E. Particle dynamics of debris produced during laser-plasma soft X-ray generation[J]. J. Appl. Physics,2001,89(2):1458-1462.
[24] HIGASHIGUCHI T,RAJYAGURU C,DOJYO N,et al.. Debris characteristics of a laser-produced tin plasma for extreme ultraviolet source[J]. Rev. Scientific Instruments,2005,76:126102.
[25] NAKAMURA D,TAMARU K,AKIYAMA T,et al.. Investigation of debris dynamics from laser-produced tin plasma for EUV lithography light source[J]. Appl. Phys. A,2008,92:767-772.
[26] BOLLANTI S,BONFIGLI F,BURATTINI E,et al.. High-efficiency clean EUV plasma source at 10~30 nm,driven by a long-pulse-width excimer laser[J]. Appl. Phys. B.,2003,76:277-284.
[27] HARILALB S S,O'SHAY,TAO Y,et al.. Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects[J]. Appl. Phys. B.,2007,86:547-553.
[28] The center X-ray optics[EB/OL].[2012-07-11].http://www-cxro.lbl.gov/optical_constants/gastrn2.html.
[29] TAKAHASHI A,NAKAMURA D,TAMARU K,et al.. Emission characteristics of debris from CO2 and Nd: YAG laser-produced tin plasmas for extreme ultraviolet lithography light source[J]. Appl. Phys. B.,2008,92:73-77.
[30] NAMBA S,FUJIOKA S,NISHIMURA H,et al.. Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography[J]. Appl. Phys. Lett.,2006,88:171503.
[31] HIGASHIGUCHI T,KAWASAKI K,SASAKI W,et al.. Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses[J]. Appl. Phys. Lett.,2006,88:161502.
[32] HIGASHIGUCHI T,DOJYO N,HAMADA M,et al.. Low-debris,efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide(SnO2) nanoparticles[J]. Appl. Phys. Lett.,2006,88:201503.
[33] TAO Y,TILLACK M S. Mitigation of fast ions from laser-produced sn plasma for an extreme ultraviolet lithography source[J]. Appl. Phys. Lett.,2006,89:111502.
[34] 林景全,陈波,尼启良,等. 激光等离子体软X射线源靶材的选择及特性[J]. 强激光与粒子束,1998,10(3):429-432. LIN J Q,CHEN B,NI Q L,CAO J L,et al.. Target material choice and its characteristic of laser-produced plasma source[J]. High Power Laser and Particle Beams,1998,10(3):429-432.(in Chinese)
[35] 朱新旺,王新兵,傅焰峰,等. CO2激光等离子体极紫外光源收集镜研究[J]. 激光技术,2010,34(6):725-728. ZHU X W,WANG X B,FU Y F,et al.. Research of collector mirrors of CO2 laser produced plasma EUV source[J]. Laser Technology,2005,34(6):725-728.(in Chinese)
[36] 程元丽,李思宁,王琪,等. 激光等离子体和气体放电EUV光刻光源[J]. 激光技术,2004,28(6):561-564. CHENG Y L,LI S N,WANG Q. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. Laser Technology,2004,28(6):561-564.(in Chinese)
[37] DUNNEP, CUMMINS T,WHITE J,et al.. Laser-produced terbium and gadolinium plasmas as EUVL source at 6.5~6.7 mm[C]//International Workshop on EUV Source 2010,Dublin,Ireland,Nov.13-15,2010.
[38] PLATONOV Y. Status of EUVL multilayer optics deposition at RIT[C]//International Workshop on EUV Source 2010,P31,Dublin,Ireland,Nov.13-15,2010.
[39] BENSCHOP J. EUV:Status and challenges ahead[C]//Proceedings of the 2010 International Workshop on EUVL,Maui,HI,Jun.24,2010.
[40] SASAKI A,NISHIHARA K,SUNAHARA A,et al.. Theoretical investigation of the spectrum and conversion efficiency of short wavelength extreme-ultraviolet light sources based on terbium plasmas[J]. Appl. Phys. Lett.,2010,97:231501.
[41] CARROLL P K,O'SULLIVAN G. Ground-state configurations of ionic species I through XVI for Z=57-74 and the interpretation of 4d-4f emission resonances in laser-produced plasmas[J]. Phys. Rev. A.,1982,25:275-286.
[42] GWYN C W,STULEN R,SWEENEY D,et al.. Extreme ultraviolet lithography[J]. Vac. Sci. Technol. B,1998,16:3142-3419.
[43] FUJIOKA S,NISHIMURA H,NISHIHARA K,et al.. Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas[J]. Phys. Rev. Lett.,2005,95:235004.
[44] TANAKA H,MATSUMOTO A,AKINAGA K,et al.. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas[J]. Appl. Phys. Lett.,2005,87:041503.
[45] HAYDEN P,CUMMINGS A,MURPHY N,et al.. 13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources[J]. J. Appl. Phys.,2006,99:093302.
[46] FUJIOKA S,SHIMOMURA M,SHIMADA Y,et al.. Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme1ultraviolet light source production[J]. Appl. Phys. Lett.,2008,92:241502.
[47] OTSUKA T,KILBANE D,WHITE J,et al.. Rare-earth plasma extreme ultraviolet sources at 6.5-6.7 nm[J]. Appl. Phys. Lett.,2010,97:111503.
[48] CUMMINS T,OTSUKA T,YUGAMI N,et al.. Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma[J]. Appl. Phys. Lett.,2012,100:06118.
[49] OTSUKA T,KILBANE D,HIGASHIGUCHI T,et al.. Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources[J]. Appl. Phys. Lett.,2010,97:231503.
[50] HIGASHIGUCHI T,OTSUKA T,YUGAMI N,et al.. Extreme ultraviolet source at 6.7 nm based on a low-density plasma[J]. Appl. Phys. Lett.,2011,99:191502.
[51] COLOMBANT D,TONON G F. X-ray emission in laser-produced plasmas[J]. J. Appl. Phys.,1973,44:3524-3537.
[52] LIN J Q,TOSHIHISA T. Supply of a particle-included droplet as laser plasma target for extreme ultraviole emission[J]. J. Phys. D. Appl. Phys.,2009,42:045204.
[53] LIN J Q,TOSHIHISA T. Enhancement of EUV emission intensity from particles in a droplet by exploding the droplet[J]. J. Phys. D. Appl. Phys.,2009,42:155203.
[54] SUN Y B,LIN J Q,GAO X,et al.. Characteristics of ion debris from laser-produced tin plasma and mitigation of energetic ions by ambient gas[J]. Sci China-Phys Mech Astron,2012,55:392-395.
[55] LIN J Q,WEBER N,MAUL J,et al.. At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy[J]. Optics Lett.,2007,32(13):1875-1877.
[56] LIN J Q,WEBER N,ESCHE M,et al.. Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy[J]. Optics Express,2008,16(20):15343-15352.
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