Volume 6 Issue 1
Feb.  2013
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WANG Ping, TIAN Wei, WANG Ru-dong, WANG Li-peng. Influence of mounting stress on wavefront distortion of lithographic object lens[J]. Chinese Optics, 2013, 6(1): 57-63. doi: 10.3788/CO.20130601.0057
Citation: WANG Ping, TIAN Wei, WANG Ru-dong, WANG Li-peng. Influence of mounting stress on wavefront distortion of lithographic object lens[J]. Chinese Optics, 2013, 6(1): 57-63. doi: 10.3788/CO.20130601.0057

Influence of mounting stress on wavefront distortion of lithographic object lens

  • Received Date: 13 Sep 2012
  • Rev Recd Date: 15 Nov 2012
  • Publish Date: 10 Feb 2013
  • To design the mounting structure of a lithographic object lens, the influence model of mounting stress on the lens wavefront distortion was built. The relation between mounting stress and refractivity and the influence of mounting stress on the wavefront distortion of the lens were studied. First, based on the crystal theory, the relationship of lens mounting stress and wavefront distortion of a fused silica lens was established. Then, the influence of different lens mounting structures on the lens wavefront distortion was analyzed. Finally, the properties of lens mounting wavefront distortion were researched, and the fitted lens mounting structure was selected. Analysis results indicate that the lens mounting stress has a great influence on the lens wavefront distortion. The wavefront distortion of a 3-point mounting structure is 3.69 nm. However, the wavefront distortion induced by mounting stress decreases with the increasing mounting points. The above 9-point mounting structure is fitted to the lithographic object lens.

     

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