Volume 7 Issue 2
Mar.  2014
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LIU Shu-jie, ZHANG Yuan-liang, ZHANG Hong-chao. Profile measurement of thin transparentsoft film surface[J]. Chinese Optics, 2014, 7(2): 326-331. doi: 10.3788/CO.20140702.0326
Citation: LIU Shu-jie, ZHANG Yuan-liang, ZHANG Hong-chao. Profile measurement of thin transparentsoft film surface[J]. Chinese Optics, 2014, 7(2): 326-331. doi: 10.3788/CO.20140702.0326

Profile measurement of thin transparentsoft film surface

  • Received Date: 16 Oct 2013
  • Rev Recd Date: 18 Feb 2014
  • Publish Date: 25 Mar 2014
  • In order to realize a high-precision and wild area measurement for the surface profile of photoresist, we studied on a new measurement method. First, based on the physical properties of soft thin film, we proposed a method combining white light interferometer with mechanical ball cantilever to measure the surface profile. Then using this system, we did the measurement experiments on the notch and transparent material. The results show that for the notch, the precision of the system's measuring error is less than 2% and the measuring standard deviation is less than 1 nm, indicating that it is possible to measure the surface with high accuracy. For the transparent material, it shows that with this system the effect of multiple reflection on profile measurement can be overcome.

     

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  • [1] International Technology Roadmap for Semiconductor(ITRS 2009), 2010. [2] CONLEY W, BENDIK J. Is ArF the final wavelength[J]. Proc SPIE, 2004, 5376:16-20. [3] 巩岩, 张巍. 光刻曝光系统的现状及发展[J]. 中国光学, 2008, 1(1):25-35. GONG Y, ZHANG W. Present status and progress in 193 nm exposure[J]. Chinese Optics, 2008, 1(1):25-35.(in Chinese) [4] 吴兆喜, 黄元庆. 基于光学原理的三维形貌测量技术研究[J]. 光学技术, 2006, 32:654-658. WU ZH X, HUANG Y Q. Study on optical methods for 3-D shape measurement[J]. Opt. Technique, 2006, 32:654-658.(in Chinese) [5] 王佳, 赵洋, 张书练, 等. 纳米计量学与纳米计量测试技术(一)[J]. 航空计测技术, 1995, 15(5):3-5. WANG J, ZHAO Y, ZHANG SH L, et al.. Nano metrology and nano metrology testing technology(1)[J]. Aviation Metrology & Measurement Technology, 1995, 15(5):3-5.(in Chinese) [6] 张立超, 高劲松. 长春光机所深紫外光学薄膜技术研究进展量[J]. 光学 精密工程, 2011, 11(20):2395-2401. ZHANG L CH, GAO J S. Developments of DUV coating technology in CIOM[J]. Opt. Precision Eng., 2011, 11(20):2395-2401.(in Chinese) [7] FUKUDA K, ITO T, KOBAYASHI M. Nano indentation of the resist for electron beam lithography[J]. JSME Annual Meeting, 2003(4):105-106. [8] 王淑珍, 谢铁邦, 常素萍. 复合型超精密表面形貌测量仪[J]. 光学 精密工程, 2011, 19(4):828-835. WANG SH ZH, XIE T B, CHANG S P. Combined profilometer for ultra-precision surface topography[J]. Opt. Precision Eng., 2011, 19(4):828-835. [9] LIU S, NAGASAWA S, TAKAHASHI S, et al.. Development of a multi-ball-cantilever AFM for measuring resist surface[J]. J. Robotics and Mechatronics, 2006, 18(6):698-704. [10] ZYGO C. NewView Accessories. Product guide for the NewView 3D Surface Profiler, 2001.
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