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[3] | 基于Varifocal变焦结构视光学系统设计[J]. Chinese Optics. doi: 10.37188/CO.2024-0176 |
[4] | WANG Xin-yu, LI Wen-hao, WANG Wei, LIU Zhao-wu, JIANG Shan, ZHOU Wen-yuan, Bayanheshig. Error modeling and analysis of dual-frequency laser interferometry in scanning beam interference lithography system[J]. Chinese Optics, 2025, 18(2): 224-236. doi: 10.37188/CO.2024-0149 |
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[10] | LIU Ye, LIU Yu, XIAO Hui-dong, LI Hong-ling, QU Da-peng, ZHENG Quan. 638 nm narrow linewidth diode laser with a grating external cavity[J]. Chinese Optics, 2020, 13(6): 1249-1256. doi: 10.37188/CO.2020-0249 |
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[12] | JIANG Yan-xiu, HAN Jian, LI Wen-hao, Bayanheshig. Characteristic analysis for different beamsplitters of the plane holographic grating lithography system[J]. Chinese Optics, 2015, 8(2): 241-247. doi: 10.3788/CO.20150802.0241 |
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[14] | WU Hai-bin, TANG Sha-you, CHENG Hao, WANG Hui, YU Xiao-yang. Calibration of color coupling and color unbalance in coded structured light system[J]. Chinese Optics, 2013, 6(4): 521-528. doi: 10.3788/CO.20130604.0521 |
[15] | CHEN Wei, DING Ya-lin, HUI Shou-wen, NIE Pin, YU Chun-feng. Design of image plane focusing structure for push-scan aerial remote sensing instrument[J]. Chinese Optics, 2012, 5(1): 30-34. doi: 10.3788/CO.20120501.0030 |
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[18] | MENG Fan-jiang, YANG Gui-long LI Dian-jun SHAO Cun-lei ZHANG Lai-ming Guo Jin Guo Li-hong, . EMC design of high-power TEA CO2 laser system[J]. Chinese Optics, 2009, 2(3): 236-241. |
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[20] | GONG Yan, ZHANG Wei. Present status and progress in 193 nm exposure[J]. Chinese Optics, 2008, 1(1): 25-35. |