Citation: | ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565. |
[1] D.阿特伍德. 软X射线与极紫外辐射的原理和应用 [M]. 张杰 . 北京:科学出版社,2003. ATTWOOD D T. Soft X-ray and Extreme Ultraviolet Radiation:Principle and Applications[M]. ZHANG J. Beijing:Science Press,2003.(in Chinese)
[2] SPILLER E. Soft X-ray Optics[M]. Bellingham:SPIE Optical Engineering Press,1994.
[3] DUMOND J,YOUTZ J P. An X-ray method for determining rate of diffusion in solid state[J]. J. Appl. Phys.,1940,11(5):357-365.
[4] SPILLER E. Low-loss reflection coatings using absorbing materials[J]. Appl. Phys. Lett.,1972,20(9):365-369.
[5] BARBEE Jr T W. Sputtered layered synthetic microstructure(LSM) dispersion elements[J]. AIP Conf. Proc.,1981,75:131-145.
[6] MONTCALM C,GRABNER R F,HUDYMA R M,et al.. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system[J]. Appl. Opt.,2002,41(16):3262-3269.
[7] LOUIS E,van HATTUM E D,van der WESTERN S A,et al.. High reflectance multilayers for EUVL HVM-projection optics[J]. SPIE,2010,7636:76362T.
[8] 陈波,尼启良,王君林. 软X射线-极紫外波段光学研究[J]. 光学 精密工程 ,2007,15(12):1862-1868. CHEN B,NI Q L,WANG J L. Soft X-ray and extreme ultraviolet optics in CIOMP[J]. Opt. Precision Eng.,2007,15(12):1862-1868(in Chinese).
[9] 林炳. 软X射线多层膜膜厚分布均匀性控制研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. LIN B. Study on thickness distribution uniformity control of soft X-ray multilayer mirrors . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese)
[10] 朱洪力. 极紫外/软X射线多层膜热稳定性研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2008. ZHU H L. Researches of thermal stability of the EUV/SXR multilayers . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese)
[11] 尼启良,刘世界,陈波. 小型高精度软X射线-极紫外反射率计[J]. 光学 精密工程 ,2008,16(10):1886-1890. NI Q L,LIU SH J,CHEN B. Compact high-precision soft X-ay and extreme ultraviolet reflectometer[J]. Opt. Precision Eng.,2008,16(10):1886-1890.(in Chinese)
[12] 向鹏. 13 nm Mo/Si多层膜残余应力研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. XIANG P. Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese)
[13] 秦俊岭,邵建达,易葵,等. Mo/Si软X射线多层膜的界面粗糙度研究[J]. 强激光与粒子束 ,2007,19(5):763-765. QIN J L,SHAO J D,YI K,et al.. Interface roughness of Mo/Si soft X-ray multilayer[J]. High Power Laser and Particle Beams,2007,19(5):763-765.(in Chinese)
[14] 秦俊岭,邵建达,易葵,等. 研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟[J]. 光学学报 ,2007,36(2):300-303. QIN J L,SHAO J D,YI K,et al.. A simulation study of the influence of interdiffusion barrier on soft X-ray reflectivity of Mo/Si multilayers,Acta Opt. Sinica,2007,36(2):300-303.(in Chinese)
[15] 秦俊岭,邵建达,易葵. 用不同的Mo靶溅射功率制备Mo/Si多层膜[J]. 强激光与粒子束 ,2007,19(1):67-69. QIN J L,SHAO J D,YI K. Mo/Si multilayers prepared with different sputtering power of Mo target[J]. High Power Laser and Particle Beams,2007,19(1):67-69.(in Chinese)
[16] 朱京涛,黄秋实,白亮,等. 不同本底真空度下SiC/Mg极紫外多层膜的制备和测试[J]. 光学 精密工程 ,2009,17(12):2946-2951 ZHU J T,HUANG Q SH,BAI L,et al.. Manufacture and measurement of SiC/Mg EUV multilayer mirrors in different base pressures[J]. Opt. Precision Eng.,2009,17(12):2946-2951.(in Chinese)
[17] 吴文娟. 极紫外和软X射线窄带多层膜的研究 . 上海:同济大学 ,2007. WU W J. The Study of extreme ultraviolet and soft X-ray narrowband multilayers . Shanghai:Tongji University,2007.(in Chinese)
[18] 王洪昌. 极紫外与软X射线多层膜偏振元件研究 . 上海:同济大学 ,2007. WANG H CH. The research of multilayer polarizing components in extreme ultraviolet and soft X-ray . Shanghai:Tongji University,2007.(in Chinese)
[19] KAISER N,YULIN S,PERSKE M,et al.. High-performance EUV multilayer optics[J]. SPIE,2008:71010Z.
[20] SOUFLI R,SPILLER E,SCHMIDTA M A,et al.. Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution[J]. SPIE,2001,4343:51-59.
[21] TAKAHARU M. Nikon EUVL development progress update . 2006 EUVL Symposium Proceedings,Nikon T.Miura,16 Oct,2006.
[22] MIURA T,MURAKAMI K,SUZUKI K,et al.. Nikon EUVL development progress summary[J]. SPIE,2006,6151:615105.
[23] JEON C,KEARNER P,MA A,et al.. Enabling defect-free masks for extreme ultraviolet lithography[J]. SPIE,2007,6533:653310.
[24] YULIN S,FEIGL T,KUHLMANN T,et al.. Interlayer transition zones in Mo/Si superlattices[J]. J. Appl. Phys.,2002,92(3):1216-1220.
[25] STEARNS D G,GAINS D P,SWEENEYS D W,et al.. Nonspecular X-ray scattering in a multilayer-coated imaging system[J]. J. Appl. Phys.,1998,84(2):1003-1028.
[26] SCHRODER S,FEIGL T,DUPARRE A,et al.. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates[J]. Opt. Express,2007,15(20):13997-14012.
[27] HENKE B L,GULLIKSON E M,DAVIS J C. X-ray interactions:photoabsorption, scattering, transmission and reflection at E=50~30,000 eV, Z=1-92[J]. Atomic. Data and Nucl. Table,1993,54:181-342.
[28] ASCHENTRUP A,HACHMANN W,WESTERWALBESLOH,et al.. Determination of layer-thickness fluctuations in MoSi multilayers by cross-sectional HR-TEM and X-ray diffraction[J]. Appl. Phys. A.,2003,77:607-611.
[29] YAKSHIN A E,Van de KRUIJS R W E,NEDELCU I,et al.. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition[J]. SPIE,2007,6517:65170L.
[30] BAJT S,ALAMEDA J,BARBEE T,et al.. Improved reflectance and stability of Mo/Si multilayers[J]. SPIE,2001,4506:65-75.
[31] BRAUN S,FOLTYN T,VAN LOYEN L,et al.. Multi-component EUV multilayer mirrors[J]. SPIE,2003,5037:274-285.
[32] SPILLER E,BAKER S,PARRA E,et al.. Smoothing of mirror substrates by thin-flim deposition[J]. SPIE,1999,3767:143-153.
[33] BAKSHI V. EUV Lithography[M]. Bellingham:SPIE Optical Engineering Press,2006.
[34] SPILLER E. High performance multilayer coatings for EUV lithography[J]. SPIE,2004,5193:89-97.
[35] FOLTA J A,BAJT S,BARBEE T W,et al.. Advances in multilayer reflective coatings for extreme-ultraviolet lithography[J]. SPIE,1999,3676:702-709.
[36] SOUFLI R,HUDYMA R M,SPILLER E,et al.. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography[J]. Appl. Opt.,2007,41(16):3262-3269.
[37] FREITAG J M,CLEMENS B M. Stress evolution in Mo/Si multilayers for high reflectivity extreme ultraviolet mirrors[J]. Appl. Phys. Lett.,1998,73:43-45.
[38] TINONE M,HAGA T,KINOSHITA. Multilayer sputter deposition stress control[J]. Electron Spectro. Relat. Phenom.,1996,80:461-464.
[39] SHIRAISHI M,ISHIYAMA W,OSHINO T,et al.. Low stress molybdenum/silicon multilayer coatings for extreme ultraviolet lithography[J]. Jpn. J. Appl. Phys.,2000,39:6810-6814.
[40] SHIRAISHI M,KANDAKA N,MURAKAMI K. Low-stress and high-reflective molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography[J]. SPIE,2004,5374:104-111.
[41] ZOETHOUT E,SIPOS G,van de KRUIJS R W E,et al.. Stress mitigation in Mo/Si multilayers for EUV lithography[J]. SPIE,2003,5037:872-878.
[42] BENOIT N,YULIN S,FEIGL T,et al. EUV multilayer mirrors with enhanced stability. [J]. SPIE,2006,6317:63170K.
[43] KAISER N,YULIN S,FEIGL T. Si-based multilayers with high thermal stability[J]. SPIE,2000,4146:91-100.
[44] BAJT S,STEARNS D G. High-temperature stability multilayers for extreme-ultraviolet condenser optics[J]. Appl. Opt.,2005,44:7735-7743.
[45] BENOIT N,YULIN S,FEIGL T,et al. High-temperature multilayers[J]. SPIE,2005,5751:1155-1161.
[46] DOMINGO V. Soho,Yohkoh, Ulysses and trace:the four solar missions in perspective and available resources[J]. Astrophysics and Space Science,2002,282:171-188.
[47] DEFISE J M,MOSES J D,CATURA R C,et al.. Calibration of EIT instrument for the SOHO mission[J]. SPIE,1995,2517:29-39.
[48] SOUFLI R,WINDT D L,ROBINSON J C,et al. Development and testing of EUV multilayer coatings for the atomspheric imaging assembly instrument aboard the solar dynamics observatory[J]. SPIE,2005,5901:59010M.
[49] WINDT D L,DONGUY S,SEELY J,et al.. Experimental comparison of extreme-ultraviolet multilayers for solar physics[J]. Appl. Opt.,2004,43(9):1835-1848.
[50] KESKI-KUHA R A M. Layer synthetic microstructure technology considerations for the ectreme ultraviolet[J]. Appl. Opt.,1984,23(7):3534-3537.
[51] BROSIUS J W,DAVILA J M,THOMAS R J. Solar active region and quiet-sun extreme-ultraviolet spectra from SERTS-95[J]. Astrophysical J. Suppl. Series,1998,119:225-276.
[52] SEELY J F. Multilayer grating for the Extreme Ultraviolet Spectrometer(EUS)[J]. SPIE,2000,4138:174-181.
[53] KOWALSKI M P,WOOD K S,BARSTOW M A,et al.. It's time for a new EUV orbital mission[J]. SPIE,2010,7732:77322E.
[54] KOWALSKI M P,BERENDSE F B,BARBEE T W,et al.. The joint astrophysical plasmadynamic experiment(J-PEX) high-resolution EUV spectrometer diffraction grating efficiency[J]. SPIE,2006,41386266:62660W.
[55] KOWALSKI M P,CRUDDACE R G,WOOD K S,et al.. Proposed multilayer-grating designs for the Astrophysical Plasmadynamic Explorer(APEX):an EUV high-resolution spectroscopic SMEX[J]. SPIE,2004,5168:21-30.
[56] KOWALSKI M P,BARBEE Jr T W,CRUDDACE R G,et al.. Efficiency and long-term stability of a multilayer-coated, ion-etched blazed holographic gratings in the 125-133 wavelength region[J]. Appl. Opt.,1995,34:7338-7346.
[57] SEELY J F,CRUDDACE R G,KOWALSKI M P,et al.. Polorization and efficiency of a concave multilayer grating in the 135-250- region and in normal-incidence and seya-namioka mounts[J]. Appl. Opt.,1995,34:7347-7354.
[58] OSTERRIED K,HIDEMANN and NELLES B. Groove profile modification of blazed gratings by dip coating with hardenable liquids[J]. Appl. Opt.,1998,37(34):8002-8007.
[59] HUI L,LIFENG L. Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask[J]. Appl. Opt.,2008,47:6212-6218.
[60] HUI L,LICHAO Z,LIFENG L,et al.. High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region[J]. Opt. Lett.,2008,33(5):485-487.
[61] KOWALSKI M P,SEELY J F,HUNTER W R,et al.. Dual waveband operation of a multilayer-coated diffraction grating in the soft X-ray range at near-normal incidence[J]. Appl. Opt.,1993,32:2422-2425.
[62] LICHAO Z,HUI L,CHUNSHUI J,et al.. Broadband multilayer-coated normal incidence blazed grating with ~10% diffraction efficiency through the 13-16 nm wavelength region[J]. Opt. Lett.,2009,34(6):818-820.
|