Objective optical mounts and analysis for EUVL

[1] WU B,KUMAR A. Extreme ultraviolet lithography:a review[J]. J. Vac. Sci. Technol.,2007,B25(6):1743-1761. [2] HUDYMA R. An overview of optical systems for 30 nm resolution lithography at EUV wavelengths[J]. SPIE,2002,4832:137-148. [3] STULEN R H,SWEENEY D W. Extreme ultraviolet lithography[J]. IEEE J. Quantum Elec.,1999,35:649-699. [4] SOMMARGREN G E,PHILLION D W,JOHNSON M A. 100-picometer interferometry for EUVL[J]. SPIE,2002,4688:316-320. [5] WAGNER C,HARNED N,KUERZ P,et al.. EUV into production with ASML's NXE platform[J]. SPIE,2010,7636:76361H-1. [6] MIURA T,MURAKAMI K,SUZUKI K,et al.. Nikon EUVL development progress summary[J]. SPIE,2006,6151:615105. [7] 王忠素,翟岩,梅贵,等 . 空间光学遥感器反射镜柔性支撑的设计[J]. 光学 精密工程 ,2010,18(8):1833-1840. WANG ZH S,ZHAI Y,MEI G,et al.. Design of flexible support structure of reflector in space remote sensor[J]. Opt. Precision Eng.,2010,18(8):1833-1840.(in Chinese) [8] 闫勇,贾继强,金光. 新型轻质大口径空间反射镜支撑设计[J]. 光学 精密工程 ,2008,16(8):1533-1539. YAN Y,JIA J Q,JIN G. Design of new type spaceborne lightweighted primary mirror support[J]. Opt. Precision Eng.,2008,16(8):1533-1539.(in Chinese) [9] BLANDING D L. Principles of exact constraint mechanical design . Eastman Kodak Company, Rochester,USA,1992:68-74. [10] TICHENOR D A,KUBIAK G D,REPLOGLE W C,et al.. EUV engineering test stand[J]. SPIE,2000,3997:48-69. [11] OSHINO T,SHIRAISHI M,KANDAKA N,et al.. Development of illumination optics and projection optics for high-NA EUV exposure tool(HiNA)[J]. SPIE,2003,5037:75-82. [12] KURZ P. Optics for EUV lithography . 2nd International Workshop on EUV Lithography, Burlingame,USA,Oct.2000. [13] 苗健宇,张立平,吴清文,等 .测绘相机光学镜筒设计、加工及装配[J]. 光学 精密工程 ,2008,16(9):1648-1653. MIAO J Y,ZHANG L P,WU Q W,et al.. Design,manufacturing and assembly for optical lens of mapping camera[J]. Opt. Precision Eng.,2008,16(9):1648-1653.(in Chinese)