Volume 4 Issue 2
Apr.  2011
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LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.
Citation: LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.

Progress in grating parameter measurement technology

  • Received Date: 13 Jan 2011
  • Rev Recd Date: 14 Mar 2011
  • Publish Date: 25 Apr 2011
  • Grating parameter measurement technology is a key evaluation criterion of grating fabrication. This paper introduces several kinds of grating measuring methods that have been relative mature in present. It focuses on the Atomic Force Microscopy(AFM) method, Scanning Electron Microscopy(SEM), Laser Diffraction(LD) method and scattering measuring method(ellipsometry), and describes their working principles, developing trends and their own advantages and disadvantages. It points out that the AFM and SEM methods can measure the local profile of a grating and can get its surface profile defect. The LD method and scattering method can reflect average results of a laser radiation region, in which the LD method can give the grating period parameters and the ellipsometry can offer the other parameters except the period parameters. Furthermore, the grating parameters gotten by these method are identical, and the LD method provides a minimum uncertainty, the AMF method comes second and the SEM is the last one. In the end, it discusses the developing directions of grating parameter measurement technologies.

     

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  • [1] 祝绍箕,邹海兴,包学诚.衍射光栅[M]. 北京:机械工业出版社,1986. ZHU SH J,ZOU H X,BAO X CH. Diffracted Grating[M]. Beijing:China Machine Press,1986. (in Chinese) [2] 巴音贺希格,李燕,吴娜,等. 紫外平面刻划光栅杂散光数值分析及测试[J]. 光学 精密工程 ,2009,17(8):1783-1789. Bayanheshig,LI Y,WU N,et al.. Numerical analysis and measurement of stray light from UV ruled gratings[J]. Opt. Precision Eng.,2009,17(8):1783-1789. (in Chinese) [3] 卢向东. 椭偏法测量光栅参数的理论研究 . 成都:四川大学 ,2003. LU X D. Theoretical study of measuring grating parameters with ellipsmetry . Chengdu:Sichuan University,2003.(in Chinese) [4] PAN S P,CHEN CH J, CHANG L CH. 1-D pitch measurement by laser diffractometer and Atomic Force Microscope . International Symposium on Precision Mechanical Measurements,Hefei,China,11-16 Aug. 2002:5-059-5-063. [5] YAO B CH,PAN SH P,CHEN CH J,et al.. SEM 1-D grating measurement compare to AFM and laser diffractometer . International Symposium on Instrumentation Science and Technology,Hefei,China,11-16 Aug. 2002:2-034-2-037. [6] DONALD A CH,EGBERT B,DAVID L B,et al.. Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy[J]. SPIE,2008,6922,69223J. [7] MICHAEL R M,CHRISTOPHER J R,S SOHAIL H N,et al.. Subwavelength photoresist grating metrology using scatterometry[J]. SPIE,1995,2352:251-261. [8] MELI F,THALMANN R,BLATTNER P. High precision pitch calibration of gratings using laser diffractometry . Proc. of the 1st Int. Conf. on Precision Engineering and Nanotechnology,Bremen,May 1999,2:252-255. [9] EGBERT B,WINFRIED M,ALEXANDER D,et al.. Multi-wavelength VIS/UV optical diffractometer for high-accuracy calibration of nano-scale pitch standards[J]. Measurement Sci. and Technol.,2007,18:667-674. [10] JENNIFER E D,BUHR E,DIENER A,et al.. Report on an international comparison of one-dimensional(1D) grating pitch[J]. Metrologia,2009,46:04001. [11] 倪重文,陈宪锋,沈小明,等. 分光计测定光栅常数[J]. 大学物理实验 ,2008,22(2):50-53. NI ZH W,CHEN X F,SHEN X M,et al.. Discussion on the experiment of diffracive grating constant with spectrometer[J]. Physical Experiment College,2008,22(2):50-53.(in Chinese) [12] PETRE C L,JOHN R M,ADRIAN S,et al.. The characterization of grating using the optical scatteromter[J]. Romanian J. Physics,2010,55(3-4):376-385. [13] BABAR K M,STEPHEN A C,SOHAIL S,et al.. Ellipsometric scatterometry for the metrology of sub-0.1 μm-linewidth structures[J]. Appl. Opt.,1998,37(22):5112-5115. [14] NI X,JAKATDAR N,BAO J,et al.. Specular spectroscopic scatterometry in DUV lithography[J]. SPIE,1999,3667:159-168. [15] HSU-TING H,FRED L T. Erratum to 'Spectroscopic ellipsometry and reflectometry from gratings(Scatterometry) for critical dimension measurement and in situ, real-time process monitoring’[J]. Thin Solid Films,2004,468:339-346. [16] PETRE C L. Phase-modulation scatterometry[J]. Appl. Opt.,2002,41(34):7187-7192. [17] WEI SH M,LI L F. Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network[J]. Appl. Opt.,2008,47(13):2524-2532. [18] ANTOS R,OHLIDAL I,MISTRIK J,et al.. Spectroscopic ellipsometry on lamellar gratings[J]. Appl. Surface Sci.,2005,244:225-229. [19] 张丽娟,傅克祥,李建龙,等. 用透射光谱法测光栅参数的数值模拟[J]. 激光杂志 ,2005,26(3):42-44. ZHANG L J,FU K X,LI J L,et al.. The numerical simulation of measuring grating parameters with the transmission spectrum method[J]. Laser J.,2005,26(3):42-44.(in Chinese) [20] 张丽娟,傅克祥,麻建勇,等. 透射光谱法测光栅参数的可行性[J]. 激光技术 ,2005,29(2):165-168. ZHANG L J,FU K X,MA J Y,et al.. The feasibility of measuring grating parameters with the transmission spectrum method[J]. Laser Technol.,2005,29(2):165-168. (in Chinese) [21] 李健龙,傅克祥,朱建华,等. 用光栅正负一级能量比侧体积相位全息光栅参量[J]. 光子学报 ,2006,35(2):239-243. LI J L,FU K X,ZHU J H,et al.. Determining the parameters of VPHG with the diffractive efficiencies ratio (+1/-1)[J]. Acta Photonica Sinica,2006,35(2):239-243.(in Chinese) [22] 张丽娟,卢向东,欧伟英. 对正负一级能量比测量光栅参量方法的改进[J]. 光学学报 ,2006,26(11):1605-1608. ZHANG L J,LU X D, OU W Y. Improvement on measuring grating parameters with diffraction orders of m=±1 efficiencies ratio[J]. Acta Opt. Sinica,2006,26(11):1605-1608.(in Chinese) [23] 付赛,陈海清. 一种基于CCD的实时测量光栅常数的方法[J]. 应用光学 ,2005,26(1):53-55. FU S,CHEN H Q. A new method based on CCD to measure the constant of grating[J]. J. Appl. Opt.,2005,26(1):53-55.(in Chinese) [24] 李岩,花国梁.精密测量技术[M]. 北京:中国计量出版社,2001. LI Y , HUA G L. Precision Measurement Technology[M]. Beijing:China Metrology Press,2001.(in Chinese) [25] 谭鑫,李文昊,巴音贺希格,等. 紫外全息闪耀光栅的制作[J]. 光学 精密工程 ,2010,18(7):1536-1542. TAN X,LI W H,Bayanheshig,et al.. Fabrication of ultraviolet holographic blazed grating[J]. Opt. Precision Eng.,2010,18(7):1536-1542.(in Chinese) [26] 金伟华,金春水,张立超,等. 基于混合优化算法测定铝薄膜光学常数[J]. 光学 精密工程 ,2008,16(9):1582-1588. JIN W H,JIN C SH,ZHANG L CH,et al.. Determination of optical constants for aluminum thin film based on combined optimal algorism[J]. Opt. Precision Eng.,2008,16(9):1582-1588.(in Chinese)
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