Volume 4 Issue 2
Apr.  2011
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WEI Yao-wei, LIU Zhi-chao, CHEN Song-lin. Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions[J]. Chinese Optics, 2011, 4(2): 188-195.
Citation: WEI Yao-wei, LIU Zhi-chao, CHEN Song-lin. Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions[J]. Chinese Optics, 2011, 4(2): 188-195.

Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions

  • Received Date: 25 Nov 2010
  • Rev Recd Date: 13 Jan 2011
  • Publish Date: 25 Apr 2011
  • Atomic Layer Deposition(ALD) was used to deposit TiO2/Al2O3 films at 110 ℃ and 280 ℃ on quartz and BK7 substrates in this paper. The microstructures of thin films were investigated by an X-ray duffractineter, and the Laser Induced Damage Threshold(LIDT) of samples was measured on a measuring table by a damage test system. Then, the damaged morphologies of the samples were investigated by an Atomic Force Microscope(AFM) and a Nomarski optical microscope, respectively. The results indicate that the films deposited by ALD show better uniformity and transmission, and its uniformity is better than 99% for a Ф50 mm sample and transmission is more than 99.8% at 1 064 nm. Furthermore, the LIDTs of the TiO2/Al2O3 films are (6.730.47) J/cm2 and (6.50.46) J/cm2 at 110 ℃ on quartz and BK7 substrates, respectively, which is notably better than that at 280 ℃.

     

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