Design of dynamic L-type impedance matching network in RF excited fast axial flow CO2 lasers
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摘要:
针对高功率轴快流CO2激光器射频放电阻抗的匹配问题，本文设计了低反射率、高动态匹配范围的阻抗匹配网络，以实现射频激励轴快流CO2激光器在不同放电结构下射频功率的高效利用。基于射频电路阻抗匹配理论，构建了多电极等效电路模型，提出向匹配网络中引入可调高压陶瓷电容的方法，设计了适用于高功率射频激励轴快流CO2激光器的动态L型匹配网络。模拟的动态L型匹配网络可向16根放电管注入60 kW射频功率，在12.81 Ω~49.94 Ω总负载阻抗范围内反射率小于1%。搭建了单管射频放电实验装置，实验测得动态L型匹配网络在4 kW注入功率下反射率小于1%，与仿真结果相符。上述结果表明引入可调高压陶瓷电容的动态L型匹配网络能够实现高动态范围内的阻抗匹配，基本满足高功率射频激励轴快流CO2激光器匹配电路的设计要求。
Abstract:In order to solve the problem of RF discharge impedance matching of high-power fast axial flow CO2 lasers, an impedance matching network with low reflectivity and high dynamic matching range was designed to realize the efficient utilization of RF excited fast axial flow CO2 lasers under different discharge structures. Based on the impedance matching theory of RF circuits, a multi-electrode equivalent circuit model was constructed, a method of introducing tunable high-voltage ceramic capacitors into the matching network was proposed, and a dynamic L-type matching network suitable for high-power RF excited fast axial flow CO2 lasers was designed. The simulated dynamic L-type matching network can inject 60 kW RF power into 16 discharge tubes and achieve a reflectivity of less than 1% in the range of total load impedance of 12.81 Ω~49.94 Ω. A single-tube RF discharge experimental device was built, and the reflectivity of the dynamic L-type matching network was measured as less than 1% at 4 kW injection power, which was consistent with the simulation results. It is proved that the dynamic L-type matching network with adjustable high-voltage ceramic capacitors can achieve impedance matching in the high dynamic range, which meets the design requirements of high-power RF excited fast axial flow CO2 laser matching circuits.
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Key words:
- fast axial flow CO2 laser /
- RF excitation /
- impedance matching /
- L-type dynamic matching
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图 4 L型阻抗匹配网络。(a) a=−0.186, b=5.186；(b) a=2.180, b=−5.209
Figure 4. L-type impedance matching network. The corresponding solution of Eq. (8): (a) a=−0.186, b=5.186; (b) a=2.180, b=−5.209
图 5 反射率
$ \eta $ /电压增益G/功率沉积WL与等离子体电阻RL关系曲线Figure 5. Relationship curve of reflectivity η/voltage gain G/power deposition WL versus plasma resistance RL
图 7 动态匹配网络。(a) C1-等效电阻调节曲线；(b)反射率调节曲面；(c)等效电阻调节曲面；(d)等效电抗调节曲面
Figure 7. Dynamic matching network. (a) C1-equivalent resistance adjustment curve; (b) reflectance adjustment surface; (c) equivalent resistance adjustment surface; (d) equivalent reactance adjustment surface
图 8 动态阻抗匹配网络驻波比调节曲面（匹配中心C1=127.6 pF, C2=89.6 pF）
Figure 8. The dynamic impedance matching network’s VSWR adjustment surface (match center C1=127.6 pF, C2=89.6 pF)
图 9 动态阻抗匹配网络史密斯圆图。等离子体阻抗为38.6
${ \Omega }\text{-17.7}\;{ \Omega }\text{j} $ Figure 9. Smith chart of dynamic impedance matching network. Plasma impedance is 38.6
${ \Omega }\text{-17.7}\;{ \Omega }\text{j} $ 
图 10 (a)单管射频放电动态阻抗匹配网络；(b)实际阻抗匹配网络装置
Figure 10. (a) Single-tube RF discharge dynamic impedance matching network; (b) Actual device of the impedance matching network
表 1 激光器工作参数
Table 1. Laser operating parameters
电源功率 射频频率 内径 外径 电极长度 电极面积 工作气压 工作温度 60 kW 13.56 MHz 24 mm 28 mm 300 mm 5.37×10−3 m2 10 kPa 400 K 
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