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摘要:
随着生物荧光技术的迅速发展，对信号传输的精度要求也越来越高。滤光膜作为系统分光的核心器件，其光谱特性直接影响系统的传输精度。本文选用Nb2O5与SiO2作为高低折射率材料，利用高斯变迹函数结合Optilayer膜系软件对多通道负滤光膜进行膜系优化设计。采用电感耦合磁控溅射沉积技术，在D263T基板上研制多通道负滤光膜。通过对膜层敏感度的反演分析，解决了膜厚控制误差对光谱偏移及通带透过率降低的问题。研究了工艺参数对膜层粗糙度的影响因素，通过调节电感耦合等离子源(ICP)功率有效改善膜层表面粗糙度。所研制的多通道负滤光膜在45°入射时，中心波长576 nm、639 nm、690 nm反射带半宽度分别为5 nm、6 nm和7 nm，平均反射率约为98%。透射区545~562 nm，597~624 nm，655~675 nm和708~755 nm范围内，平均透射率达到92%。通过耐环境测试与光谱稳定性测试可知其满足生物荧光系统中多通道负滤光膜的使用要求。
Abstract:With the rapid development of bioluminescence technology, the demand for high-precision signal transmission has increased significantly. As the filter film is the core component of the system, the spectral characteristic of the filter film directly affects the accuracy of signal transmission. In this study, Nb2O5 and SiO2 were selected as high and low refractive index materials, respectively. A multi-channel negative filter was optimized using the Gaussian apodization function and Optilayer software. The filter film was deposited on a D263T substrate using an inductively coupled magnetron sputtering technique. The effect of thickness control errors on spectral shift and passband transmittance was addressed through inverse film sensitivity analysis. The effect of process parameters on film roughness was investigated, and it was found that adjusting the inductively coupled plasma (ICP) power could effectively improve film roughness. When the developed multi-channel negative filter was tested at a 45° angle of incidence, the reflectance half-bandwidths of the center wavelengths of 576 nm, 639 nm, and 690 nm were 5 nm, 6 nm and 7 nm, respectively, with an average reflectance of about 98%. The average transmittance in the transmission ranges of 545−562 nm, 597−624 nm, 655−675 nm, and 708−755 nm was 92%. The multi-channel negative filter successfully passed both the environmental resistance test and the spectral stability test, thus meeting the application requirements of the multi-channel negative filter in the bioluminescence system.
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图 1 Nb2O5薄膜的特性曲线。(a)不同充氧量膜层透过率曲线；(b)不同ICP功率膜层透过率曲线；(c)不同充氧量及ICP功率膜层折射率曲线；(d) 充氧量为125 mL/min，ICP功率为3 kW膜层光学常数曲线
Figure 1. Characteristic curves of Nb2O5 film. (a) Transmission curves of the film layer with different oxygen charging amounts; (b) transmission curves of the film layer with different ICP powers; (c) refractive index curves of the film layer with different oxygen charging amounts and different ICP powers; (d) optical constant curves of the film layer with an oxygen flow rate of 125 mL/min and an ICP power of 3 kW
图 2 SiO2薄膜的特性曲线。(a)不同充氧量膜层透过率曲线；(b)不同充氧量膜层光学常数曲线；(c)不同靶材功率膜层沉积速率曲线；(d)不同沉积速率膜层光学常数曲线
Figure 2. Characteristic curves of SiO2 film. (a) Transmission curves of the film layer with different oxygen charging amounts; (b) optical constant curves of the film layer with different oxygen charging amounts; (c) deposition rate curves of the film layer with different target powers; (d) optical constant curves of the film layer with different deposition rates
图 3 不同靶材功率下SiO2薄膜的表面粗糙度。(a) 2 kW (b) 4 kW (c) 6 kW
Figure 3. The surface roughnesses of the SiO2 film at different target powers. (a) 2 kW; (b) 4 kW; (c) 6 kW
图 4 45°入射的前表面理论光谱曲线
Figure 4. Theoretical spectral curve of the front surface at a 45° incidence angle
图 5 45°入射的后表面透射光谱曲线
Figure 5. Theoretical spectral curve of back surface at a 45° incidence angle
图 6 45°入射的双面透射光谱曲线
Figure 6. Spectral curve of bilateral transmission at a 45° incidence angle
图 8 不同ICP功率下膜层表面粗糙度变化情况。(a) Nb2O5；(b) SiO2
Figure 8. Variation of surface roughness under different ICP powers. (a) Nb2O5; (b) SiO2
图 9 多通道负滤光膜的特性曲线。(a) 设计与测试光谱曲线；(b) 36~64层的敏感度分布曲线；(c) 随机误差(1%~3%)光谱曲线；(d) 负滤光膜实测光谱曲线
Figure 9. Characteristic curves of multi-channel negative filter film. (a) Design and measurement curves; (b) sensitivity distribution curve for layers 36−64; (c) spectral curve with random errors (1%−3%); (d) measured spectral curve of negative filter film
图 10 多通道负滤光膜百格测试图
Figure 10. Hundred squares test chart of multi-channel negative filter film
表 1 多通道负滤光膜光谱参数
Table 1. Spectral parameters of multi-channel negative filter film parameters
Cut-off region of
wavelengthReflection half
band widthTransmissive
regionBoth sides
cut-off region$ {\lambda _{\text{1}}} $@576 nm T<5% 5 nm @545~562 nm T>90% @531~535 nm T<3% $ {\lambda _{\text{2}}} $@639 nm T<5% 6 nm @597~624 nm T>90% @775~785 nm T<3% $ {\lambda _{\text{3}}} $@690 nm T<5% 7 nm @655~675 nm T>90% @708~755 nm T>90% 
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表 2 高低折射率膜层厚度比所对应的反射带半宽度
Table 2. Half-width of the reflection band corresponding to the high and low refractive-index film thickness ratio
$ x $ $ y $ Half band width /nm 3 0.46 9.4 4 0.41 8.3 5 0.36 7.2 6 0.23 6.5 7 0.18 5.3
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表 3 单层膜SiO2与Nb2O5的工艺参数
Table 3. Process parameters for single-layer films of SiO2 and Nb2O5
Material TG1-Nb TG2/TG3-Si ICP1/2 Coating Parameter Power/
kWAr flow/
mL·min−1Power/
kWAr flow/
mL·min−1O2 flow/
mL·min−1Temperature/
°CRate/
nm·s−1Pressure/
PaSiO2 6.0 60 3.0 50 110 130 0.8 9.6×10−4 Nb2O5 6.0 60 3.0 50 125 130 0.4 1.0×10−3
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