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少周期脉冲双光学选通门电场的精密调控

苏航 王小伟 王家灿 王力 赵增秀

苏航, 王小伟, 王家灿, 王力, 赵增秀. 少周期脉冲双光学选通门电场的精密调控[J]. 中国光学(中英文). doi: 10.3724/CO.2025-0112
引用本文: 苏航, 王小伟, 王家灿, 王力, 赵增秀. 少周期脉冲双光学选通门电场的精密调控[J]. 中国光学(中英文). doi: 10.3724/CO.2025-0112
SU Hang, WANG Xiao-Wei, WANG Jia-can, WANG Li, ZHAO Zeng-xiu. Precise control of the electric field in double optical gating with few-cycle pulses[J]. Chinese Optics. doi: 10.3724/CO.2025-0112
Citation: SU Hang, WANG Xiao-Wei, WANG Jia-can, WANG Li, ZHAO Zeng-xiu. Precise control of the electric field in double optical gating with few-cycle pulses[J]. Chinese Optics. doi: 10.3724/CO.2025-0112

少周期脉冲双光学选通门电场的精密调控

cstr: 32171.14.CO.2025-0112
基金项目: 国家自然科学基金(No. 12234020,No. 12450403)
详细信息
    作者简介:

    王小伟(1986—),男,湖北宜城人,副教授,主要从事强场超快物理及阿秒科学技术研究。E-mail:xiaowei.wang@nudt.edu.cn

  • 中图分类号: O562.3;O437.1;TN241

Precise control of the electric field in double optical gating with few-cycle pulses

Funds: Supported by National Natural Science Foundation of China (No. 12234020, No. 12450403)
More Information
  • 摘要:

    为了利用少周期脉冲实现超短孤立阿秒脉冲产生,需要研究双光学选通门技术对少周期光场电场的精密调控。在传统实验中,双光学选通门的调控对象通常是多周期脉冲,在分析中不考虑激光脉冲在介质传播中的高阶色散、倍频效率及倍频电场的精确波形,但这种近似对于少周期脉冲不再适用。本文基于耦合波方程组模型精确模拟了少周期脉冲在非线性晶体中的传播与倍频过程,揭示了色散效应等因素对选通门波形的关键影响。研究表明,当驱动光场为少周期激光脉冲时,双光学选通门的传统电场估算方法已不再适用。少周期脉冲激光具有超宽的频谱,不同波长成分的光相位累计差异导致的群速度失配、相位失配和色散等效应相比于长脉冲会明显很多。对于少周期脉冲,调整偏硼酸钡(BBO)晶体厚度为126.4 μm时,可以得到最佳选通光场。本文提出通过协同调节波片与BBO晶体厚度可以精细调节驱动场与倍频场的相对延迟,实现选通电场及驱动电场的优化,为超短孤立阿秒脉冲的产生提供了有效的参数优化指导。

     

  • 图 1  双光学选通门调控光场示意图。QP1和QP2为石英片,BW为融石英布儒斯特窗片,BBO为β相偏硼酸钡晶体

    Figure 1.  Schematic diagram of double optical gating technique. QP1 and QP2 are quartz plates, BW is a fused-silica Brewster window, and BBO is a beta-phase barium metaborate crystal for frequency doubling

    图 2  瞬态耦合波方程组计算倍频光场强度分布,经过141 μm BBO晶体倍频后的脉冲与SNLO计算得到的光场(a)长脉冲($\tau $=28 fs);(b)少周期脉冲($\tau $=8 fs)分布结果比较

    Figure 2.  Comparison of the intensity profiles of SH optical field calculated with transient coupled-wave equations, the calculated SH pulse after frequency doubling of a 28 fs long pulse through a 141 μm BBO crystal and the optical field calculated by SNLO. (a) For long pulse ($\tau $=28 fs); (b) for few-cycle laser pulse ($\tau $=8 fs)

    图 3  实际实验条件下双光学选通门形成的调制光场。不考虑介质色散和BBO倍频过程群速度失配的(a) 驱动电场${E}_{{\mathrm{d}}} $,选通电场${E}_{{\mathrm{g}}} $,倍频电场${E}_{{\mathrm{SH}}} $和 (c) 叠加电场${E}_{{\mathrm{d+SH}}} $;考虑介质色散和BBO倍频过程群速度失配时的(a) ${E}_{{\mathrm{d}}} $${E}_{{\mathrm{g}}} $${E}_{{\mathrm{SH}}}$及(d) 叠加电场${E}_{{\mathrm{d+SH}}} $

    Figure 3.  Modulated optical field formed by double optical gating under realistic experimental conditions. Without considering medium dispersion and group velocity mismatch in the BBO frequency-doubling process, (a) the driving field $ {E}_{{\mathrm{d}}} $, gating field$ {E}_{{\mathrm{g}}} $, and SH field $ {E}_{{\mathrm{SH}}} $ and (c) the superimposed electric field $ {E}_{\mathrm{{d+SH}}} $. When considering medium dispersion and group velocity mismatch in the BBO frequency-doubling process, (b) $ {E}_{\mathrm{{d}}} $, $ {E}_{\mathrm{{g}}} $, and $ {E}_{\mathrm{{SH}}} $ and (d) $ {E}_{{\mathrm{d+SH}}} $

    图 4  入射脉冲为7 fs时,调节K值时驱动电场、选通电场及倍频电场强度的变化

    Figure 4.  Under a 7 fs incident pulse, changes in the amplitudes of the driving field, gating field, and second-harmonic electric field when adjusting the K value

    图 5  入射脉冲为5 fs时,调节K值时驱动电场、选通电场及倍频电场强度的变化

    Figure 5.  Under a 5 fs incident pulse, changes in the amplitudes of the driving field, gating field, and second-harmonic electric field when adjusting the K value

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出版历程
  • 收稿日期:  2025-08-31
  • 录用日期:  2025-11-03
  • 网络出版日期:  2026-04-30

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