[1] |
陈宝刚, 明名, 吕天宇.大口径球面反射镜曲率半径的精确测量[J].中国光学, 2014, 7(1):163-168. http://www.chineseoptics.net.cn/CN/abstract/abstract9111.shtmlCHEN B G, MING M, LV T Y. Precise measurement of curvature radius for spherical mirror with large aperture[J]. Chinese Optics, 2014, 7(1):163-168.(in Chinese) http://www.chineseoptics.net.cn/CN/abstract/abstract9111.shtml
|
[2] |
刘淑杰, 张元良, 张洪潮.透明软质薄膜的表面形貌测量[J].中国光学, 2014, 7(2):326-331. http://www.chineseoptics.net.cn/CN/abstract/abstract9136.shtmlLIU SH J, ZHANG Y L, ZHANG H CH. Profile measurement of thin transparentsoft film surface[J]. Chinese Optics, 2014, 7(2):326-331.(in Chinese) http://www.chineseoptics.net.cn/CN/abstract/abstract9136.shtml
|
[3] |
BASILE G, BECKER P, BERGAMIN A, et al.. Combined optical and X-ray interferometry for high-precision dimensional metrology[J]. Proceedings of the Royal Society A, 2000, 456(1995):701-729. doi: 10.1098/rspa.2000.0536
|
[4] |
ILEV I, KUMAGAI H, TOYODA K, et al.. An alternative fiber-optic backreflectance method for measurement of distances using a continuous wave laser[J]. Review of Scientific Instruments, 1996, 67(3):662-665. doi: 10.1063/1.1146838
|
[5] |
万德安.激光基准高精度测量技术[M].北京:国防工业出版社, 1999.WAN D A. Laser Precision Measurement Technology[M]. Beijing:National Defense Industry Press, 1999.(in Chinese)
|
[6] |
昌学年, 姚毅, 闫玲.位移传感器的发展及研究[J].计量与测试技术, 2009, 36(9):42-44. http://www.cnki.com.cn/Article/CJFDTOTAL-JLYS200909022.htmCHANG X N, YAO Y, YAN L. The development and investigation of displacement sensor[J]. Metrology & Measurement Technique, 2009, 36(9):42-44.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-JLYS200909022.htm
|
[7] |
马爱民, 马忠臣.超精密测量技术的应用进展[J].机械工程, 2013, 6:5. http://www.cnki.com.cn/Article/CJFDTOTAL-JXGU201306002.htmMA A M, MA ZH CH. Advances in application of precision measurement technology[J]. Mechanical Engineer, 2013, 6:5.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-JXGU201306002.htm
|
[8] |
周维来.光栅干涉仪在高精密测量中的技术和应用[J].工具技术, 1994, 1:37-42. http://www.cnki.com.cn/Article/CJFDTOTAL-GJJS199401008.htmZHOU W L. The technology and application of grating interferometer in high precision measurement[J]. Tool Engineering, 1994, 1:37-42.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GJJS199401008.htm
|
[9] |
TEIMEL A. Technology and Application of Grating Interferometers in High-precision Measurement[M]. Berlin:Springer Berlin Heidelberg, 1991.
|
[10] |
张善钟.计量光栅技术[M].北京:机械工业出版社, 1985.ZHANG SH ZH. Metrology Grating Technology[M].Beijing:China Machine Press, 1985.(in Chinese)
|
[11] |
曹向群.光栅计量技术[M].杭州:浙江大学出版社, 1992.CAO X Q. Grating Measuring Technique[M]. Hangzhou:Zhejiang University Press, 1992.(in Chinese)
|
[12] |
尚平.高精度衍射光栅干涉位移传感器及关键技术研究[D].合肥:合肥工业大学, 2012.SHANG P. Study on the key technology of high-resolution diffraction grating interferometric transducer of linear displacements[D]. Hefei:Hefei University of Technology, 2012.(in Chinese)
|
[13] |
张金华, 陈良洲, 刘晓军.双光栅干涉位移传感器原理及其误差分析[J].光电技术应用, 2012, 3:41-45. http://www.cnki.com.cn/Article/CJFDTOTAL-GDYG201203013.htmZHANG J H, SUN L ZH, LIU X J. Principle and error analysis of dual-grating interference displacement sensor[J]. Electro-Optic Technology Application, 2012, 3:41-45.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GDYG201203013.htm
|
[14] |
森山茂夫, 郑建栋.用衍射光栅进行精密位移检测[J].国外计量, 1984, 6:11-13. http://www.cnki.com.cn/Article/CJFDTOTAL-XDJL198406003.htmSENSHAN M F, ZHENG J D. Precision displacement measurement with diffraction grating[J]. Foreign Measurement, 1984, 6:11-13.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-XDJL198406003.htm
|
[15] |
吕海宝, 曹聚亮, 颜树华, 等.光栅式大量程高分辨率位移测量研究[J].中国机械工程, 2000, 11(8):878-880. http://www.cnki.com.cn/Article/CJFDTOTAL-ZGJX200008013.htmLU H B, CAO J L, YAN SH H, et al.. Research for wide range and high resolution displacement measurement with grating[J]. China Mechanical Engineering, 2000, 11(8):878-880.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-ZGJX200008013.htm
|
[16] |
HOLZAPFEL W. Advancements in displacement metrology based on encoder systems[C]. Proceedings of the 23rd Annual ASPE Meeting, Portland, USA, 2008.
|
[17] |
THIEL J, SPANNER E. Interferential linear encoder with 270 mm measurement length for nanometrology[C]. Proceedings of the 1st International Conference and general meeting of the European Society for Precision Engineering and Nanotechnology, Bremen, Germany, 1999:419-422.
|
[18] |
LOF J, DERKSEN A T A M, HOOGENDAM C A, et al.. Lithographic Apparatus and Device Manufacturing Method:US, 6819400B2[P]. 2005-10-21.
|
[19] |
郑立.三光栅系统[J].光学仪器, 1982, 4(1):35-42ZHENG L. Three grating system[J]. Optical Instruments, 1982, 4(1):35-42.(in Chinese)
|
[20] |
苏绍璟, 刘辉, 吕海宝, 等.纳米级位移分辨率双光栅系统的多普勒分析[J].光学精密工程, 2003, 11(1):17-21. http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM200301003.htmSU SH J, LIU H, LU H B, et al.. Doppler analysis for double-grating displacement measurement system with nanometer resolution[J]. Opt. Precision Eng., 2003, 11(1):17-21.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM200301003.htm
|
[21] |
卢国刚.SONY跨入皮米级检测和加工时代[J].世界制造技术与装备市场, 2008, 1:92. http://www.cnki.com.cn/Article/CJFDTOTAL-ZBSC200801032.htmLU G G. SONY jumping to pico meter world[J]. Key Components for CNC Machine Tool, 2008, 1:92. http://www.cnki.com.cn/Article/CJFDTOTAL-ZBSC200801032.htm
|
[22] |
SAWADA R, HIGURASHI E, OHGUCHI O, et al.. Long-life micro-laser encoder[C]. Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems, 2000:491-495.
|
[23] |
SAWADA R, HIGURASHI E, ITO T, et al.. Monolithic-integrated microlaser encoder[J]. Applied Optics, 1999, 38(33):6866-6873. doi: 10.1364/AO.38.006866
|
[24] |
SAWADA R, OHGUCHI O, MISE K, et al.. Fabrication of advanced integrated optical micro-encoder chip[C]. Proceedings of the Micro Electro Mechanical Systems, 1994, MEMS'94, IEEE, 1994:337-342.
|
[25] |
SAWADA R, TANAKA H, OHGUCHI O, et al.. Fabrication of active integrated optical micro-encoder[C]. Proceedings of the Micro Electro Mechanical Systems, 1991, MEMS'91, IEEE, 1991:233-238.
|
[26] |
WAKAMOTO S, KANAYA Y, KOSUGI J, et al.. Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning[J]. SPIE, 2010, 7640:79-86. https://www.researchgate.net/publication/253303974_Actual_performance_data_analysis_of_overlay_focus_and_dose_control_of_an_immersion_scanner_for_double_patterning
|
[27] |
MAST F V D. Towards ultimate optical lithography with NXT:1950i dual stage immersion platform[J]. SPIE, 2010:7640:511-519. http://adsabs.harvard.edu/abs/2010SPIE.7640E..55C
|
[28] |
SHIBAZAKI Y, KOHNO H, HAMATANI M. An innovative platform for high-throughput high-accuracy lithography using a single wafer stage[J]. SPIE, 2009, 7274:72741-10. https://www.researchgate.net/publication/253014363_An_innovative_platform_for_high-throughput_high-accuracy_lithography_using_a_single_wafer_stage
|
[29] |
PASCH B V D, MAST F V D. Enabling the lithography roadmap:an immersion tool based on a novel stage positioning system[J]. SPIE, 2009, 7274:72741S-8. https://www.researchgate.net/publication/253776706_Enabling_the_lithography_roadmap_an_immersion_tool_based_on_a_novel_stage_positioning_system
|
[30] |
WAKAMOTO S, KIKUCHI T, SHIRATA Y, et al.. Stability and calibration of overlay and focus control for a double patterning immersion scanner[J]. SPIE, 2008, 7973(6):3620-3625. https://www.researchgate.net/publication/253726726_Stability_and_Calibration_of_Overlay_and_Focus_Control_for_a_Double_Patterning_Immersion_Scanner
|
[31] |
LI X, GAO W, MUTO H, et al.. A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage[J]. Precision Engineering Journal of the International Societies for Precision Engineering & Nanotechnology, 2013, 37(3):771-781. https://www.researchgate.net/publication/256969690_A_six-degree-of-freedom_surface_encoder_for_precision_positioning_of_a_planar_motion_stage
|
[32] |
KIMURA A, GAO W, KIM W J, et al.. A sub-nanometric three-axis surface encoder with short-period planar gratings for stage motion measurement[J]. Precision Engineering, 2012, 36(4):576-585. doi: 10.1016/j.precisioneng.2012.04.005
|
[33] |
GAO W, KIMURA A. A fast evaluation method for pitch deviation and out-of-flatness of a planar scale grating[J]. CIRP Annals-Manufacturing Technology, 2010, 59(1):505-508. doi: 10.1016/j.cirp.2010.03.035
|
[34] |
GAO W, KIMURA A. A Three-axis displacement sensor with nanometric resolution[J]. CIRP Annals-Manufacturing Technology, 2007, 56(1):529-532. doi: 10.1016/j.cirp.2007.05.126
|
[35] |
GAO W, DEJIMA S, KIYONO S. A dual-mode surface encoder for position measurement[J]. Sensors & Actuators A Physical, 2005, 117(1):95-102.
|
[36] |
DEJIMA S, GAO W, SHIMIZU H, et al.. Precision positioning of a five degree-of-freedom planar motion stage[J]. Mechatronics, 2005, 15(8):969-987. doi: 10.1016/j.mechatronics.2005.03.002
|
[37] |
XU D M, WENG C F, LEI M R. Research on the high accuracy displacement measuring and display system[C]. 7th International Symposium on Test and Measurement, Chinese Society of Modern Technology Equipment, Beijing:International Academic Publishers, 2007:3515-3518.(in Chinese)
|
[38] |
CHU X CH, LU H B, ZHAO SH H. Wide rang grating interferometer with nanometer resolution[J]. Optp-electronic Engineering, 2008, 35(1):56-59.(in Chinese) https://www.researchgate.net/publication/296808256_Wide-range_grating_interferometer_with_nanometer_resolution
|
[39] |
CHU X CH, LU H B, CHEN T ZH, et al.. Investigation on long-range nanometer resolution grating moire interferometer[J]. SPIE, 2004, 5635:333-341.
|
[40] |
杜列波.纳米级光栅位移测量中关键技术的研究[D].长沙:国防科学技术大学, 2004.DU L B. Research on key technology of nano scale grating displacement[D]. Changsha:National University of Defense Technology, 2004.(in Chinese)
|
[41] |
SU SH J, LU H B. High-speed great-capacity storing and processing technique of video sensor signal[J]. SPIE, 2000, 4077:396-399.
|
[42] |
PU J, ZHANG H, NEMOTO S. Spectral shifts and spectral switches of partially coherent light passing through an aperture[J]. Optics Communications, 1999, 162(1-3):57-63. doi: 10.1016/S0030-4018(99)00051-6
|
[43] |
POST D. Moire fringe multiplication with a nonsymmetrical doubly blazed reference grating[J]. Applied Optics, 1971, 10(4):901-907. doi: 10.1364/AO.10.000901
|
[44] |
FAN K C, ZHANG Y L, MIAO J W, et al.. Error compensation of grating interferometer due to angular error of linear stage[C]. Proceedings of the Advanced Intelligent Mechatronics (AIM), IEEE, 2012:428-431.
|
[45] |
FAN K C, LIU Y S, CHEN Y J, et al.. A linear diffraction grating interferometer with high accuracy[J]. SPIE, 2006, 6280:628008-6.
|
[46] |
KAO C F, LU S H, SHEN H M, et al.. Diffractive laser encoder with a grating in littrow configuration[J]. Japanese J. Applied Physics, 2008, 47(3):1833-1837. doi: 10.1143/JJAP.47.1833
|
[47] |
CHUNG Y C, FAN K C, LEE B C. Development of a novel planar encoder for 2D displacement measurement in nanometer resolution and accuracy[C]. Proceedings of the 9th World Congress on Intelligent Control and Automation (WCICA), Taiwan, China, 2011:PID1723643.
|
[48] |
WU C C, WU W J, PAN Z S, et al.. Laser linear encoder with both high fabrication and head-to-scale tolerances[J]. Applied Optics, 2007, 46(16):3169-3176. doi: 10.1364/AO.46.003169
|
[49] |
LEE C K, WU C C, CHEN S J, et al.. Design and construction of linear laser encoders that possess high tolerance of mechanical runout[J]. Applied Optics, 2004, 43(31):5754-5762. doi: 10.1364/AO.43.005754
|
[50] |
HSIEH H L, PAN S W. Development of a grating-based interferometer for six-degree-of-freedom displacement and angle measurements[J]. Optics Express, 2015, 23(3):2451-2465. doi: 10.1364/OE.23.002451
|
[51] |
HSIEH H L, PAN S W. Three-degree-of-freedom displacement measurement using grating-based heterodyne interferometry[J]. Applied Optics, 2013, 52(27):6840-6848. doi: 10.1364/AO.52.006840
|
[52] |
HSIEH H L, CHEN J C, LERONDEL G, et al.. Two-dimensional displacement measurement by quasi-common-optical-path heterodyne grating interferometer[J]. Optics Express, 2011, 19(10):9770-9782. doi: 10.1364/OE.19.009770
|
[53] |
HSIEH H L, LEE J Y, WU W T, et al.. Quasi-common-optical-path heterodyne grating interferometer for displacement measurement[J]. Measurement Science & Technology, 2010, 21(11):280-284.
|
[54] |
WANG L J, ZHANG M, ZHU Y, et al.. American society for precision engineering a novel heterodyne grating interferometer system for in-plane and out-of-plane displacement measurement with nanometer resolution[C]. Proceedings of the Meeting of the American Society for Precision Engineering, ASPE, 2014.
|
[55] |
LIN D, JIANG H, YIN C. Analysis of nonlinearity in a high-resolution grating interferometer[J]. Optics & Laser Technology, 2000, 32(2):95-99.
|
[56] |
WANG L J, ZHANG M, ZHU Y, et al.. Construction and accuracy test of a novel heterodyne grating interferomter system for two-dimensional displacement measurement[J]. Laser, 2013, 89(3):69.
|
[57] |
朱煜, 张鸣, 王磊杰, 等.一种双频光栅干涉仪位移测量系统:中国,WO2014/071816A1[P]. 2013-02-20. ZHU Y, ZHANG M, WANG L J, et al.. Dual-frequency grating interferometer displacement measurement system:China, WO2014/071816A1[P]. 2013-02-20.(in Chinese)
|
[58] |
张鸣, 朱煜, 王磊杰, 等.一种二自由度外差光栅干涉仪位移测量系统:中国,WO2014/201950A1[P]. 2013-09-18. ZHANG M, ZHU Y, WANG L J, et al.. Displacement measurement system for two-degree-of-freedom heterodyne grating interferometer:China, WO2014/201950A1[P]. 2013-09-18.(in Chinese)
|
[59] |
张鸣, 朱煜, 王磊杰, 等.一种外差光栅干涉仪位移测量系统:中国,WO2014/071807A1[P]. 2013-02-27. ZHANG M, ZHU Y, WANG L J, et al.. Heterodyne grating interferometer displacement measurement system:China, WO2014/201950A1[P]. 2013-02-27.(in Chinese)
|
[60] |
WEI P, LU Z, LIU L. Double-grating diffraction interferometric stylus probing system for surface profiling and roughness measurement[C]. International Symposium on Precision Engineering Measurement and Instrumentation. International Society for Optics and Photonics, 2015:94461N.
|
[61] |
王雪英.基于衍射干涉原理的高精度光栅位移测量系统研究[D].哈尔滨:哈尔滨工业大学, 2014. http://cn.bing.com/academic/profile?id=85ea26740fef3b7fa6ab892e28475896&encoded=0&v=paper_preview&mkt=zh-cnWANG X Y. Research of high-precision displacement measurement system based on the principle of diffraction and interference[D]. Harbin:Harbin Institute of Technology, 2014.(in Chinese) http://cn.bing.com/academic/profile?id=85ea26740fef3b7fa6ab892e28475896&encoded=0&v=paper_preview&mkt=zh-cn
|
[62] |
LIN J, GUAN J, MA L, et al.. Effects of parameters of Bessel-Gaussian on the achievement of optical needle with longitudinal polarization[J]. SPIE, 2013, 8759:875937.
|
[63] |
徐敏儿.基于衍射光栅的高分辨力位移测量系统研究[D].哈尔滨:哈尔滨工业大学, 2013.XU M E. Research on and high-resolution displacement measurement system based on diffractive grating[D]. Harbin:Harbin Institute of Technology, 2013.(in Chinese)
|
[64] |
邸晶晶.基于衍射光栅的高精度位移测量系统的设计[D].哈尔滨:哈尔滨工业大学, 2012.DI J J. Design of high-precision displacement measurement system based on diffractive grating[D]. Harbin:Harbin Institute of Technology, 2012.(in Chinese)
|
[65] |
CHENG F, FAN K C. An improved design of the linear diffraction grating interferometer[C]. Proceedings of ASPEN20009, Kitakyushu, Japan, 2009.
|
[66] |
XIA H J, FEI Y T, WANG Z Y. Basic theoretical research about the 2-D diffraction grating in nano-scale measurement[R], ISIST2004, 1226-1231.
|
[67] |
刘玉圣, 范光照, 陈叶金.高精度线性衍射光栅干涉仪的研制[J].工业计量, 2006, 16(2):1-3. http://www.cnki.com.cn/Article/CJFDTOTAL-GYJL200602000.htmLIU Y SH, FAN G ZH, CHEN Y J. A research on diffraction grating interferometer with high accuracy[J]. Industrial Measurement, 2006, 16(2):1-3.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GYJL200602000.htm
|
[68] |
AKIHIRO K. Optical displacement measurement system:US, 6407815B2[P].2002-06-18.
|
[69] |
KURODA A. Optical displacement measurement system for detecting the relative movement of a machine part:US, 6166817[P].2000-12-26.
|
[70] |
TANIGUCHI K, TSUCHIYA H, TOYAMA M. Optical instrument for measuring displacement:US, 4676645[P].1987-06-30.
|
[71] |
SCHATTENBURG M L, SMITH H I. The critical role of metrology in nanotechnology[J]. SPIE, 2002, 4608:116-124. http://d.wanfangdata.com.cn/NSTLQK_10.1117-12.437273.aspx
|