极紫外多层膜技术研究进展

张立超

极紫外多层膜技术研究进展

张立超

中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春 130033

详细信息

作者简介:
张立超 (1979—),男,吉林人,博士,副研究员,主要从事短波光学薄膜技术方面的研究。 E-mail:lichaod@yahoo.com.cn

中图分类号: O484
计量
- 文章访问数: 4972
- HTML全文浏览量: 480
- PDF下载量: 2316
- 被引次数: 0
出版历程
- 收稿日期: 2010-06-11
- 修回日期: 2010-08-13
- 刊出日期: 2010-12-20

Progress in EUV multilayer coating technologies

ZHANG Li-chao

State Key Laboratory of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China

摘要

摘要: 在极紫外波段,任何材料都表现出极强的吸收特性,因此,采用多层膜实现高反射率是构建正入射式光学系统的唯一途径。本文总结了极紫外多层膜的发展进程,叙述了制备极紫外多层膜的关键技术(磁控溅射、电子束蒸发、离子束溅射)以及它们涉及的相关设备。由于多层膜反射式光学元件主要应用于极紫外光刻与极紫外天文观测,文中重点讨论了极紫外光刻系统对多层膜性能的要求,镀膜过程中的面形精度和热稳定性等问题;同时介绍了极紫外天文观测中使用的多层膜的特点,特别讨论了多层膜光栅的制备技术和亟待解决的问题。
- 极紫外多层膜 /
- 极紫外光刻 /
- 多层膜光栅
Abstract: All materials have strong absorptin properties in Extreme Ultra Violet(EUV) region. Therefore, it is an only approach to construct a normal incidence optical system by using multilayer coatings to improve its reflectivity. In this paper, the development of EUV multilayer coatings is introduced and the key technologies for fabricating multilayer coatings(magnetron sputtering, electron beam evaporating, ion beam sputtering) and their relative apparatus are described. As multilayer coating reflective optical elements are mainly used in the EUV lithography and EUV astrophysics, it lays the emphasis on the study on the characteristics of multilayer coatings in EUV lithographic equipment, and the surface accuracy and thermal stability in coating processing. Furthermore, it also gives the special multilayer coatings for astronomical observations and discusses the fabrication of multilayer coating gratings and several problems to be solved.
- Extreme Ultraviolet(EUV) /
- multilayer coating /
- EUV lithography

HTML全文

参考文献(1)

[1] D.阿特伍德. 软X射线与极紫外辐射的原理和应用 [M]. 张杰 . 北京:科学出版社,2003. ATTWOOD D T. Soft X-ray and Extreme Ultraviolet Radiation:Principle and Applications[M]. ZHANG J. Beijing:Science Press,2003.(in Chinese) [2] SPILLER E. Soft X-ray Optics[M]. Bellingham:SPIE Optical Engineering Press,1994. [3] DUMOND J,YOUTZ J P. An X-ray method for determining rate of diffusion in solid state[J]. J. Appl. Phys.,1940,11(5):357-365. [4] SPILLER E. Low-loss reflection coatings using absorbing materials[J]. Appl. Phys. Lett.,1972,20(9):365-369. [5] BARBEE Jr T W. Sputtered layered synthetic microstructure(LSM) dispersion elements[J]. AIP Conf. Proc.,1981,75:131-145. [6] MONTCALM C,GRABNER R F,HUDYMA R M,et al.. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system[J]. Appl. Opt.,2002,41(16):3262-3269. [7] LOUIS E,van HATTUM E D,van der WESTERN S A,et al.. High reflectance multilayers for EUVL HVM-projection optics[J]. SPIE,2010,7636:76362T. [8] 陈波,尼启良,王君林. 软X射线-极紫外波段光学研究[J]. 光学精密工程 ,2007,15(12):1862-1868. CHEN B,NI Q L,WANG J L. Soft X-ray and extreme ultraviolet optics in CIOMP[J]. Opt. Precision Eng.,2007,15(12):1862-1868(in Chinese). [9] 林炳. 软X射线多层膜膜厚分布均匀性控制研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. LIN B. Study on thickness distribution uniformity control of soft X-ray multilayer mirrors . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [10] 朱洪力. 极紫外/软X射线多层膜热稳定性研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2008. ZHU H L. Researches of thermal stability of the EUV/SXR multilayers . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [11] 尼启良,刘世界,陈波. 小型高精度软X射线-极紫外反射率计[J]. 光学精密工程 ,2008,16(10):1886-1890. NI Q L,LIU SH J,CHEN B. Compact high-precision soft X-ay and extreme ultraviolet reflectometer[J]. Opt. Precision Eng.,2008,16(10):1886-1890.(in Chinese) [12] 向鹏. 13 nm Mo/Si多层膜残余应力研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. XIANG P. Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [13] 秦俊岭,邵建达,易葵,等. Mo/Si软X射线多层膜的界面粗糙度研究[J]. 强激光与粒子束 ,2007,19(5):763-765. QIN J L,SHAO J D,YI K,et al.. Interface roughness of Mo/Si soft X-ray multilayer[J]. High Power Laser and Particle Beams,2007,19(5):763-765.(in Chinese) [14] 秦俊岭,邵建达,易葵,等. 研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟[J]. 光学学报 ,2007,36(2):300-303. QIN J L,SHAO J D,YI K,et al.. A simulation study of the influence of interdiffusion barrier on soft X-ray reflectivity of Mo/Si multilayers,Acta Opt. Sinica,2007,36(2):300-303.(in Chinese) [15] 秦俊岭,邵建达,易葵. 用不同的Mo靶溅射功率制备Mo/Si多层膜[J]. 强激光与粒子束 ,2007,19(1):67-69. QIN J L,SHAO J D,YI K. Mo/Si multilayers prepared with different sputtering power of Mo target[J]. High Power Laser and Particle Beams,2007,19(1):67-69.(in Chinese) [16] 朱京涛,黄秋实,白亮,等. 不同本底真空度下SiC/Mg极紫外多层膜的制备和测试[J]. 光学精密工程 ,2009,17(12):2946-2951 ZHU J T,HUANG Q SH,BAI L,et al.. Manufacture and measurement of SiC/Mg EUV multilayer mirrors in different base pressures[J]. Opt. Precision Eng.,2009,17(12):2946-2951.(in Chinese) [17] 吴文娟. 极紫外和软X射线窄带多层膜的研究 . 上海:同济大学 ,2007. WU W J. The Study of extreme ultraviolet and soft X-ray narrowband multilayers . Shanghai:Tongji University,2007.(in Chinese) [18] 王洪昌. 极紫外与软X射线多层膜偏振元件研究 . 上海:同济大学 ,2007. WANG H CH. The research of multilayer polarizing components in extreme ultraviolet and soft X-ray . Shanghai:Tongji University,2007.(in Chinese) [19] KAISER N,YULIN S,PERSKE M,et al.. High-performance EUV multilayer optics[J]. SPIE,2008:71010Z. [20] SOUFLI R,SPILLER E,SCHMIDTA M A,et al.. Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution[J]. SPIE,2001,4343:51-59. [21] TAKAHARU M. Nikon EUVL development progress update . 2006 EUVL Symposium Proceedings,Nikon T.Miura,16 Oct,2006. [22] MIURA T,MURAKAMI K,SUZUKI K,et al.. Nikon EUVL development progress summary[J]. SPIE,2006,6151:615105. [23] JEON C,KEARNER P,MA A,et al.. Enabling defect-free masks for extreme ultraviolet lithography[J]. SPIE,2007,6533:653310. [24] YULIN S,FEIGL T,KUHLMANN T,et al.. Interlayer transition zones in Mo/Si superlattices[J]. J. Appl. Phys.,2002,92(3):1216-1220. [25] STEARNS D G,GAINS D P,SWEENEYS D W,et al.. Nonspecular X-ray scattering in a multilayer-coated imaging system[J]. J. Appl. Phys.,1998,84(2):1003-1028. [26] SCHRODER S,FEIGL T,DUPARRE A,et al.. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates[J]. Opt. Express,2007,15(20):13997-14012. [27] HENKE B L,GULLIKSON E M,DAVIS J C. X-ray interactions:photoabsorption, scattering, transmission and reflection at E=50~30,000 eV, Z=1-92[J]. Atomic. Data and Nucl. Table,1993,54:181-342. [28] ASCHENTRUP A,HACHMANN W,WESTERWALBESLOH,et al.. Determination of layer-thickness fluctuations in MoSi multilayers by cross-sectional HR-TEM and X-ray diffraction[J]. Appl. Phys. A.,2003,77:607-611. [29] YAKSHIN A E,Van de KRUIJS R W E,NEDELCU I,et al.. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition[J]. SPIE,2007,6517:65170L. [30] BAJT S,ALAMEDA J,BARBEE T,et al.. Improved reflectance and stability of Mo/Si multilayers[J]. SPIE,2001,4506:65-75. [31] BRAUN S,FOLTYN T,VAN LOYEN L,et al.. Multi-component EUV multilayer mirrors[J]. SPIE,2003,5037:274-285. [32] SPILLER E,BAKER S,PARRA E,et al.. Smoothing of mirror substrates by thin-flim deposition[J]. SPIE,1999,3767:143-153. [33] BAKSHI V. EUV Lithography[M]. Bellingham:SPIE Optical Engineering Press,2006. [34] SPILLER E. High performance multilayer coatings for EUV lithography[J]. SPIE,2004,5193:89-97. [35] FOLTA J A,BAJT S,BARBEE T W,et al.. Advances in multilayer reflective coatings for extreme-ultraviolet lithography[J]. SPIE,1999,3676:702-709. [36] SOUFLI R,HUDYMA R M,SPILLER E,et al.. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography[J]. Appl. Opt.,2007,41(16):3262-3269. [37] FREITAG J M,CLEMENS B M. Stress evolution in Mo/Si multilayers for high reflectivity extreme ultraviolet mirrors[J]. Appl. Phys. Lett.,1998,73:43-45. [38] TINONE M,HAGA T,KINOSHITA. Multilayer sputter deposition stress control[J]. Electron Spectro. Relat. Phenom.,1996,80:461-464. [39] SHIRAISHI M,ISHIYAMA W,OSHINO T,et al.. Low stress molybdenum/silicon multilayer coatings for extreme ultraviolet lithography[J]. Jpn. J. Appl. Phys.,2000,39:6810-6814. [40] SHIRAISHI M,KANDAKA N,MURAKAMI K. Low-stress and high-reflective molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography[J]. SPIE,2004,5374:104-111. [41] ZOETHOUT E,SIPOS G,van de KRUIJS R W E,et al.. Stress mitigation in Mo/Si multilayers for EUV lithography[J]. SPIE,2003,5037:872-878. [42] BENOIT N,YULIN S,FEIGL T,et al. EUV multilayer mirrors with enhanced stability. [J]. SPIE,2006,6317:63170K. [43] KAISER N,YULIN S,FEIGL T. Si-based multilayers with high thermal stability[J]. SPIE,2000,4146:91-100. [44] BAJT S,STEARNS D G. High-temperature stability multilayers for extreme-ultraviolet condenser optics[J]. Appl. Opt.,2005,44:7735-7743. [45] BENOIT N,YULIN S,FEIGL T,et al. High-temperature multilayers[J]. SPIE,2005,5751:1155-1161. [46] DOMINGO V. Soho,Yohkoh, Ulysses and trace:the four solar missions in perspective and available resources[J]. Astrophysics and Space Science,2002,282:171-188. [47] DEFISE J M,MOSES J D,CATURA R C,et al.. Calibration of EIT instrument for the SOHO mission[J]. SPIE,1995,2517:29-39. [48] SOUFLI R,WINDT D L,ROBINSON J C,et al. Development and testing of EUV multilayer coatings for the atomspheric imaging assembly instrument aboard the solar dynamics observatory[J]. SPIE,2005,5901:59010M. [49] WINDT D L,DONGUY S,SEELY J,et al.. Experimental comparison of extreme-ultraviolet multilayers for solar physics[J]. Appl. Opt.,2004,43(9):1835-1848. [50] KESKI-KUHA R A M. Layer synthetic microstructure technology considerations for the ectreme ultraviolet[J]. Appl. Opt.,1984,23(7):3534-3537. [51] BROSIUS J W,DAVILA J M,THOMAS R J. Solar active region and quiet-sun extreme-ultraviolet spectra from SERTS-95[J]. Astrophysical J. Suppl. Series,1998,119:225-276. [52] SEELY J F. Multilayer grating for the Extreme Ultraviolet Spectrometer(EUS)[J]. SPIE,2000,4138:174-181. [53] KOWALSKI M P,WOOD K S,BARSTOW M A,et al.. It's time for a new EUV orbital mission[J]. SPIE,2010,7732:77322E. [54] KOWALSKI M P,BERENDSE F B,BARBEE T W,et al.. The joint astrophysical plasmadynamic experiment(J-PEX) high-resolution EUV spectrometer diffraction grating efficiency[J]. SPIE,2006,41386266:62660W. [55] KOWALSKI M P,CRUDDACE R G,WOOD K S,et al.. Proposed multilayer-grating designs for the Astrophysical Plasmadynamic Explorer(APEX):an EUV high-resolution spectroscopic SMEX[J]. SPIE,2004,5168:21-30. [56] KOWALSKI M P,BARBEE Jr T W,CRUDDACE R G,et al.. Efficiency and long-term stability of a multilayer-coated, ion-etched blazed holographic gratings in the 125-133  wavelength region[J]. Appl. Opt.,1995,34:7338-7346. [57] SEELY J F,CRUDDACE R G,KOWALSKI M P,et al.. Polorization and efficiency of a concave multilayer grating in the 135-250- region and in normal-incidence and seya-namioka mounts[J]. Appl. Opt.,1995,34:7347-7354. [58] OSTERRIED K,HIDEMANN and NELLES B. Groove profile modification of blazed gratings by dip coating with hardenable liquids[J]. Appl. Opt.,1998,37(34):8002-8007. [59] HUI L,LIFENG L. Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask[J]. Appl. Opt.,2008,47:6212-6218. [60] HUI L,LICHAO Z,LIFENG L,et al.. High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region[J]. Opt. Lett.,2008,33(5):485-487. [61] KOWALSKI M P,SEELY J F,HUNTER W R,et al.. Dual waveband operation of a multilayer-coated diffraction grating in the soft X-ray range at near-normal incidence[J]. Appl. Opt.,1993,32:2422-2425. [62] LICHAO Z,HUI L,CHUNSHUI J,et al.. Broadband multilayer-coated normal incidence blazed grating with ~10% diffraction efficiency through the 13-16 nm wavelength region[J]. Opt. Lett.,2009,34(6):818-820.

施引文献

附加信息(0)

访问统计