狭缝高度对单色仪光谱分辨率的影响

张靖; 张博; 刘凯; 王楷炀; 冯树龙; 李文昊; 姚雪峰

doi:10.37188/CO.2023-0004

狭缝高度对单色仪光谱分辨率的影响

doi: 10.37188/CO.2023-0004

张靖^{1, 2,},
张博¹,
刘凯³,
王楷炀^{1, 2},
冯树龙¹,
李文昊¹,
姚雪峰^1, ,

1.
中国科学院长春光学精密机械与物理研究所, 吉林长春 130033
2.
中国科学院大学, 北京 100049
3.
长春光机科技发展有限责任公司, 吉林长春 130033

基金项目: 吉林省科技发展计划（No. 20210203053SF）

详细信息

作者简介:
张　靖（1997—），女，山西吕梁人，硕士研究生，2020年于太原理工大学获得学士学位，主要从事光谱仪器的光学设计的研究。E-mail：ciompzxx@163.com

姚雪峰（1985—），男，吉林永吉人，博士，副研究员，2009年于吉林大学获得硕士学位，2018年于中国科学院大学获得博士学位，主要从事新型光谱仪器以及天文光谱仪器方面的研究。E-mail：yaoxf@ciomp.ac.cn

中图分类号: TP394.1;TH691.9
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出版历程
- 收稿日期: 2023-01-03
- 修回日期: 2023-02-05
- 网络出版日期: 2023-04-18

Effect of slit height on the spectral resolution of a monochromator

ZHANG Jing^{1, 2
,},
ZHANG Bo¹,
LIU Kai³,
WANG Kai-yang^{1, 2},
FENG Shu-long¹,
LI Wen-hao¹,
YAO Xue-feng^{1
, ,}

1.
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China
3.
Changchun Optical Machinery Technology Development Co., Ltd., Changchun 130033, China

Funds: Supported by Jilin Provincial Science and Technology Development Plan (No. 202103053SF)

More Information

Corresponding author: yaoxf@ciomp.ac.cn

摘要

摘要:
单色仪广泛应用于光谱定标、物质分析等方面，因此，对于高光谱分辨率单色仪系统的研究具有重要意义。本文基于矢量光栅方程推导考察了入射狭缝高度对光谱仪器谱线弯曲的影响程度，给出了谱线弯曲同波长、狭缝高度的解析表达式，进而提出了一种基于狭缝高度抑制谱线弯曲的单色仪光谱分辨率优化方案。结合高灵敏度、超快时间响应探测器的性能指标要求，设计了一款光谱分辨率为0.1 nm，波段范围为185 nm~900 nm的三光栅单色仪光学系统，并搭建样机验证狭缝高度对谱线弯曲的影响，进一步探究了狭缝高度对光谱分辨率的影响规律。实验结果表明：在狭缝宽度一定时，对狭缝高度进行优化，可将光谱分辨率从0.32 nm提高至0.1 nm。
- 单色仪 /
- 谱线弯曲 /
- 狭缝高度 /
- 光谱分辨率
Abstract:
Monochromators are widely used in spectral calibration, material analysis and other aspects, so research of high spectral resolution monochromator systems is of great significance. Based on the vector grating equation, the influence of the height of the incident slit on the spectral line bending of a spectrometer is investigated, and the analytical expressions of the spectral line bending at the same wavelength and the slit height are given. An optimization scheme of the spectral resolution of the monochromator based on the suppression of spectral line bending by the slit height is proposed. According to the performance index requirements of a highly sensitive and ultra-fast time response detector, a three-grating monochromator optical system with a spectral resolution of 0.1 nm and a band range of 185−900 nm was designed, and a prototype was built to verify the influence of the slit height on spectral line bending, and to explore the influence of slit height on spectral resolution on the above basis. The experimental results show that the spectral resolution can be improved from 0.32 nm to 0.1 nm by optimizing the slit height when the slit width is fixed.
- monochromator /
- spectral line bending /
- slit height /
- spectral resolution

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图 1 光束入射到光栅的物理模型

Figure 1. Physical model of the light beam incident on the grating

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图 2 单色仪光路结构图

Figure 2. Optical path structure of the monochromator

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图 3 单色仪机械结构图

Figure 3. Mechanical structure of the monochromator

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图 4 不同波长处的点列图

Figure 4. Point diagram at different wavelengths

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图 5 测试场景图

Figure 5. Test scenario diagram

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图 6 不同高度的光阑片

Figure 6. Apertures with different heights

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图 7 不同光阑高度下，几种波长入射光的测试谱线

Figure 7. Test spectral lines of mercury lamp with different wavelengthes at different aperture heights

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图 8 不同波长和光阑高度对应的光学系统光谱分辨率

Figure 8. Spectral resolution of the optical system corresponding to different wavelengths and aperture heights

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表 1 不同光阑高度下边缘视场各个波长的点列斑RMS半径值

Table 1. RMS radius of the spot array at each wavelength of the edge field-of-view under different aperture heights (μm)

光阑高度/mm	365 nm	404 nm	435 nm	546 nm	640 nm	724 nm
10	463.356	464.985	466.487	469.361	473.763	483.237
8	445.155	446.408	447.574	449.903	463.947	470.064
6	427.317	428.212	429.059	430.771	436.474	437.252
4	409.840	410.396	410.943	412.967	419.346	429.801

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