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热蒸发与离子束溅射制备LaF3薄膜的光学特性

才玺坤 张立超 梅林 时光

才玺坤, 张立超, 梅林, 时光. 热蒸发与离子束溅射制备LaF3薄膜的光学特性[J]. 中国光学(中英文), 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808
引用本文: 才玺坤, 张立超, 梅林, 时光. 热蒸发与离子束溅射制备LaF3薄膜的光学特性[J]. 中国光学(中英文), 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808
CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics, 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808
Citation: CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics, 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808

热蒸发与离子束溅射制备LaF3薄膜的光学特性

doi: 10.3788/CO.20140705.0808
基金项目: 

国家重大科技专项(02专项)基金资助项目(No.2009ZX02205)

详细信息
    通讯作者:

    才玺坤,E-mail:christcxk@126.com

  • 中图分类号: O484.41

Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering

  • 摘要: 研究了钼舟热蒸发工艺和离子束溅射方法制备的单层LaF3薄膜的特性。首先,采用分光光度计测量了LaF3薄膜的透射率和反射率光谱,使用不同模型拟合得出薄膜的折射率和消光系数。然后,采用应力仪测量了加热和降温过程中LaF3薄膜的应力-温度曲线。最后,采用X射线衍射仪测试了薄膜的晶体结构。实验结果表明,热蒸发制备的LaF3(RH LaF3)存在折射率的不均匀性,在193 nm,其折射率和消光系数分别为1.687和510-4,而离子束溅射制备的LaF3(IBS LaF3)折射率和消光系数分别为1.714和910-4。两种薄膜表现出相反的应力状态,RH LaF3薄膜具有张应力,而IBS LaF3具有压应力,退火之后其压应力减小。热蒸发制备的MgF2/LaF3减反膜在193 nm透过率为99.4%,反射率为0.04%,离子束溅射制备的AlF3/LaF3减反膜透过率为99.2%,反射率为0.1%。

     

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出版历程
  • 收稿日期:  2014-04-15
  • 修回日期:  2014-07-18
  • 刊出日期:  2014-09-25

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