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离子束溅射制备GdF3光学薄膜沉积速率分布特性

贺健康 张立超 才玺坤 时光 武潇野 梅林

贺健康, 张立超, 才玺坤, 时光, 武潇野, 梅林. 离子束溅射制备GdF3光学薄膜沉积速率分布特性[J]. 中国光学, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356
引用本文: 贺健康, 张立超, 才玺坤, 时光, 武潇野, 梅林. 离子束溅射制备GdF3光学薄膜沉积速率分布特性[J]. 中国光学, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356
HE Jian-kang, ZHANG Li-chao, CAI Xi-kun, SHI Guang, WU Xiao-ye, MEI Lin. Deposition rate distribution of GdF3 optical coating prepared by ion beam sputtering[J]. Chinese Optics, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356
Citation: HE Jian-kang, ZHANG Li-chao, CAI Xi-kun, SHI Guang, WU Xiao-ye, MEI Lin. Deposition rate distribution of GdF3 optical coating prepared by ion beam sputtering[J]. Chinese Optics, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356

离子束溅射制备GdF3光学薄膜沉积速率分布特性

doi: 10.3788/CO.20160903.0356
基金项目: 

国家重大科技专项(02专项)基金资助项目 No.2009ZX02205

详细信息
    通讯作者:

    贺健康(1989-),男,陕西榆林人,硕士,研究实习员,2014年于西北工业大学获硕士学位,主要从事深紫外光学薄膜方面的研究。E-mail:15656579175@163.com

  • 中图分类号: O484.41

Deposition rate distribution of GdF3 optical coating prepared by ion beam sputtering

Funds: 

Supported by National Science and Technology Major Project of China No.2009ZX02205

  • 摘要: 本文采用离子束溅射方法制备GdF3薄膜,并研究其沉积速率分布特征。首先,采用膜厚仪测量得出GdF3薄膜在行星盘平面的二维沉积速率分布图,通过拟合模型得到二维沉积速率分布公式。其次,分析了束流束压及靶材角度对沉积速率分布特征的影响。最后,以二维沉积速率分布公式为基础,通过计算机编程设计均匀性挡板,并进行膜厚均匀性实验验证。结果表明,沉积速率在水平方向上满足ECS函数分布,在竖直方向上满足标准Gauss分布,拟合公式残差为2.05×10-6。改变离子源的束流和束压,沉积速率分布特征保持不变。而随着靶材角度的增大,Gauss分布的半峰宽值ω逐渐增大,峰值位置xc逐渐增大,在θ=292°时,GdF3薄膜的沉积速率最大。通过挡板修调实验,可将270 mm口径平面元件的膜厚均匀性调整为97.9%。
  • 图  1  离子束溅射系统装置图

    Figure  1.  Block diagram of ion beam sputtering system

    图  2  行星盘平面沉积速率分布图

    Figure  2.  Deposition rate distribution diagram of planetary plane

    图  3  不同XY值的沉积速率分布图及拟合结果

    Figure  3.  Deposition rate distribution diagram and the fitting results with different values of X and Y

    图  4  二维沉积速率拟合公式的计算结果与实验数据的残差图

    Figure  4.  Residual error between caculation and experiment results of fiting expression for two dimension deposition rate

    图  5  不同束流作用时沉积速率沿水平方向(Y=0)的分布图

    Figure  5.  Deposition rate distribution along horizontal axis(Y=0) in different beam current

    图  6  不同束流作用时沉积速率沿水平方向(Y=0)的归一化分布图

    Figure  6.  Normalized deposition rate distribution along horizontal axis(Y=0) in different beam current

    图  7  不同束流作用时沉积速率沿竖直方向(X=0)的分布图

    Figure  7.  Deposition rate distribution along vertical axis(X=0) in different beam current

    图  8  不同束流作用时沉积速率沿竖直方向(X=0)时的归一化分布图

    Figure  8.  Normalized deposition rate distribution along vertical axis(X=0) in different beam current

    图  9  靶材角度与水平方向(Y=0)沉积速率分布的关系图

    Figure  9.  Deposition rate distribution along horizontal axis with the target angle

    图  10  靶材角度与最大沉积速率的关系图

    Figure  10.  Maximum deposition rate with the target angle

    图  11  计算挡板的膜厚均匀性调整结果

    Figure  11.  Result for thickness uniformity of calculation mask

    图  12  均匀性挡板实物图

    Figure  12.  True picture of uniformity mask

    表  1  沉积速率分布公式拟合参数

    Table  1.   Parameters of fitting expression for deposition rate

    A(x)xcAωa3a4
    268.137411 977.62172.314-2.524 53.841 9
    ω(x)b0b1b2b3b4
    277.133-0.503 059.24×10-4-3.507×10-73.498×10-8
    下载: 导出CSV
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出版历程
  • 收稿日期:  2016-01-29
  • 修回日期:  2016-02-23
  • 刊出日期:  2016-01-25

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