双压电片镜在同步辐射光源光学系统中的应用

金利民; 罗红心; 王劼; 王纳秀; 徐中民

doi:10.3788/CO.20171006.0699

双压电片镜在同步辐射光源光学系统中的应用

doi: 10.3788/CO.20171006.0699

中国科学院上海应用物理研究所张江园区, 上海 201204

基金项目:

国家自然科学基金资助项目 11175243

详细信息

作者简介:
金利民(1984-), 男, 江苏盐城人, 博士, 助理研究员, 2009年、2012年分别于东华大学获得硕士、博士学位, 主要从事同步辐射光学与技术方面的研究。E-mail:lmjin@sinap.ac.cn

徐中民(1977—)，男，河南鲁山人，博士，研究员，2005年于中国科学院长春光学精密机械与物理研究所获得博士学位，主要从事同步辐射光束线技术方面的研究

通讯作者:
徐中民, E-mail:xuzhongmin@sinap.ac.cn

中图分类号: O434
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出版历程
- 收稿日期: 2017-06-11
- 修回日期: 2017-08-13
- 刊出日期: 2017-12-01

Application of bimorph mirror in the optical system of synchrotron radiation light source

Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Zhangjiang Campus, Shanghai 201204, China

Funds:

National Natural Science Foundation of China 11175243

More Information

Corresponding author: XU Zhong-min, E-mail:xuzhongmin@sinap.ac.cn

摘要

摘要: 介绍了双压电片镜自适应光学技术，同时为其在同步辐射光学领域中的应用与进一步发展提供前瞻性的思考与探索。根据目前已公开发表的相关文献资料，总结介绍了双压电片镜自适应光学技术，阐述了该技术的工作机理与关键参数，并对其在国际上具有代表性的同步辐射机构中的应用情况作出描述，并指出涉及的关键技术问题与未来的发展趋势：不仅要有效地解决"连接点效应"对双压电片镜技术的负面影响，还要实现亚微米乃至纳米级的聚焦光斑，这两项内容都是双压电片镜技术需要进一步解决的重要问题。未来，双压电片镜自适应光学技术可望在我国先进的第三代同步辐射装置-"上海光源（Shanghai Synchrotron Radiation Facility，SSRF）"二期工程建设中得到应用。
- 自适应光学 /
- 双压电 /
- 面形精度 /
- 同步辐射
Abstract: In this paper, the adaptive optics technology of bimorph mirror(BM) is introduced, and its application and further development in the field of synchrotron radiation are prospected. Based on the existing published literatures, this paper summarizes the adaptive optics technology of the BM, introduces the working mechanism and key parameters of the technology, and describes its application in internationally representative synchrotron radiation units, and points out the key technical issues involved and future trends. It is found that not only to solve the negative effect of so-called "junction effect" on the technology of BM, but also to produce sub-micrometer and even nanometer sized focal spots, both are the critical issues for the future development of the proposed BM technique. This adaptive optics technique is expected to be used in the phase Ⅱ construction of the advanced third generation synchrotron radiation light source in China, i.e., Shanghai Synchrotron Radiation Facility(SSRF).
- adaptive optics /
- bimorph /
- slope error /
- synchrotron radiation

HTML全文

图 1 BM结构示意图^[12]

Figure 1. Schematic diagram of BM^[12]

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图 2 安装于ESRF用于水平面上波荡器光源切向聚焦的BM^[16]

Figure 2. BM which was used to tangentially focus the undulator source in the horizontal plane at ESRF^[16]

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图 3 在SPring-8中安装于机械夹持机构内的BM^[15]

Figure 3. BM which was installed in its mechanical holder at SPring-8^[15]

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图 4 1 050 mm长，水平聚焦BM^[17]

Figure 4. A 1 050 mm long, horizontally focusing BM^[17]

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图 5 600 mm BM在施加100 V电压后弯曲半径的变化过程^[17]

Figure 5. A 600 mm BM as a function of time after applying a voltage change of 100 V^[17]

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图 6 BM镜面的波纹状起伏^[20]

Figure 6. Corrugation of the optical surface on a BM^[20]

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图 7 BM再次抛光前后的镜面面形误差曲线^[17]

Figure 7. Slope error of the BM before and after re-polishing^[17]

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图 8 BM再次抛光前(左)后(右)的X射线聚焦结果(DLS的I03光束线)^[17]

Figure 8. Images of the focused X-ray beam at DLS I03 beamline, before(left) and after(right) re-polishing of BM^[17]

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图 9 新一代BM(a)Thales-SESO示意图; (b)DLS实物图^[20]

Figure 9. Next-generation BM. (a)Thales-SESO schematic diagram and (b)DLS real view^[20]

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