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电子束蒸发和离子束溅射HfO2紫外光学薄膜

邓文渊 李春 金春水

邓文渊, 李春, 金春水. 电子束蒸发和离子束溅射HfO2紫外光学薄膜[J]. 中国光学(中英文), 2010, 3(6): 630-636.
引用本文: 邓文渊, 李春, 金春水. 电子束蒸发和离子束溅射HfO2紫外光学薄膜[J]. 中国光学(中英文), 2010, 3(6): 630-636.
DENG Wen-yuan, LI Chun, JIN Chun-shui. Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering[J]. Chinese Optics, 2010, 3(6): 630-636.
Citation: DENG Wen-yuan, LI Chun, JIN Chun-shui. Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering[J]. Chinese Optics, 2010, 3(6): 630-636.

电子束蒸发和离子束溅射HfO2紫外光学薄膜

基金项目: 

国家重大科技专项

详细信息
    作者简介:

    邓文渊(1974—),男,江西赣州人,副研究员,主要从事紫外及深紫外薄膜光学器件的制备与表征方面的研究。E-mail:dwy101@yahoo.com.cn

  • 中图分类号: O484.4

Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering

  • 摘要: HfO2薄膜在紫外光学中具有十分重要的地位,不同方法制备的HfO2薄膜特性不同,可以满足不同的实际应用需求。本文分别利用电子束蒸发和离子束溅射方法制备了用于紫外光区域的HfO2薄膜,并对薄膜的材料和光学特性进行了表征与比较。通过对单层HfO2薄膜的实测透射和反射光谱进行数值反演,得到了HfO2薄膜在230~800 nm波段的折射率和消光系数色散曲线,结果表明两种方法制备的HfO2薄膜在250 nm的消光系数均小于210-3。在此基础上,制备了两种典型的紫外光学薄膜元件(紫外低通滤波器和240 nm高反射镜),其光谱性能测试结果表明,两种不同方法制备的器件均具有较好的光学特性。

     

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出版历程
  • 收稿日期:  2010-07-12
  • 修回日期:  2010-09-14
  • 刊出日期:  2010-12-20

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