Development of phase delay mirrors for femtosecond laser systems
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摘要:
为了能对飞秒激光系统的群延迟色散(group-delay dispersion，GDD)进行调控，设计并制备了相位延迟反射镜。本文系统的研究了相位延迟反射镜补偿群延迟色散的原理，使用Nb2O5和SiO2作为高低折射率材料，并通过将相位延迟反射镜与其互补镜配对的方式平缓了群延迟色散曲线。最后，制备出了相位调控数据为−800 fs2GDD的相位延迟的反射镜，在900 nm−1100 nm范围内，反射率达到99%以上。解决了飞秒激光系统带宽调节的问题，满足飞秒激光器的使用要求。
Abstract:Phase delay mirrors were designed and prepared to regulate femtosecond laser systems’ group-delay dispersion (GDD). This paper systematically investigates the principle of compensating group-delay dispersion by phase-delay mirrors. Nb2O5 and SiO2 were used as the materials with high and low refractive indices. The group-delay dispersion curves were smoothed out by pairing the phase-delay mirrors with their complementary mirrors. The phase-delayed mirrors with phase modulation data of −800 GDD were prepared, and the reflectivity reached more than 99% in the range of 900 nm−1100 nm. The bandwidth adjustment problem of femtosecond laser systems is solved to meet the requirements of femtosecond lasers
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Key words:
- group dispersion delay /
- low oscillation /
- reflector /
- broadband modulation /
- phase modulation
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图 2 计算机拟合SiO2和Nb2O5光学常数曲线图
Figure 2. Computer fitting of SiO2 and Nb2O5 optical constant profiles
图 4 设计得到的相位延迟反射镜的（a）反射率曲线与（b）群延迟色散曲线图
Figure 4. Plot of (a) reflectance curve and (b) group delay dispersion curve of the phase delayed reflector obtained by the design
图 5 相位延迟反射镜互补镜对膜系结构
Figure 5. Structure of the film system of complementary mirror pairs for phase delayed mirror
图 6 相位延迟反射镜与互补镜组合后的（a）反射率曲线与（b）群延迟色散曲线图
Figure 6. Plot of (a) reflectance curve and (b) group delay dispersion curve for the combination of the phase delay reflector and the complementary mirror
图 7 计算和测量的相位延迟反射镜(a)反射率曲线与(b)群延迟色散曲线对比图
Figure 7. Measured and calculated phase delay reflector (a) reflectivity curve and (b) group delay dispersion curve
图 12 计算和设计的相位延迟反射镜的群延迟色散曲线
Figure 12. Calculated and designed group delay dispersion curves of phase delay mirror
表 1 相位补偿反射镜的技术参数
Table 1. Technical parameters of high dispersion mirrors
参数 具体 基板 K9或者石英 入射角度/° 0°−3° 反射率/% ≥99%@970−1100 nm GDD/$ {fs}^{2} $ −800@1030 nm GDD/$ {fs}^{2} $ 0@1060 nm 
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表 2 薄膜材料沉积工艺参数
Table 2. Material deposition parameters
材料 Nb2O5 SiO2 基底温度( °C) 145 145 工作真空(Pa) 7.7×10−1 5.2×10−1 沉积速率(nm·s−1) 0.255 0.225 ICP气体 O2+Ar O2+Ar ICP参数 Power: 2.2KW
电压： 510 V
电流： 14.5 APower: 2.2KW
电压： 730 V
电流： 8.5 A
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