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离子束溅射制备低应力深紫外光学薄膜

才玺坤 张立超 时光 贺健康 武潇野 梅林

才玺坤, 张立超, 时光, 贺健康, 武潇野, 梅林. 离子束溅射制备低应力深紫外光学薄膜[J]. 中国光学(中英文), 2016, 9(6): 649-655. doi: 10.3788/CO.20160906.0649
引用本文: 才玺坤, 张立超, 时光, 贺健康, 武潇野, 梅林. 离子束溅射制备低应力深紫外光学薄膜[J]. 中国光学(中英文), 2016, 9(6): 649-655. doi: 10.3788/CO.20160906.0649
CAI Xi-kun, ZHANG Li-chao, SHI Guang, HE Jian-kang, WU Xiao-ye, Mei Lin. Low stress DUV optical coatings deposited by ion beam sputtering[J]. Chinese Optics, 2016, 9(6): 649-655. doi: 10.3788/CO.20160906.0649
Citation: CAI Xi-kun, ZHANG Li-chao, SHI Guang, HE Jian-kang, WU Xiao-ye, Mei Lin. Low stress DUV optical coatings deposited by ion beam sputtering[J]. Chinese Optics, 2016, 9(6): 649-655. doi: 10.3788/CO.20160906.0649

离子束溅射制备低应力深紫外光学薄膜

doi: 10.3788/CO.20160906.0649
基金项目: 

国家重大科技专项(02专项)基金资助项目 No.2009ZX02205

详细信息
    通讯作者:

    才玺坤(1988-),男,吉林长春人,硕士,助理研究员,2010年、2012年于浙江大学分别获得学士、硕士学位,主要从事深紫外薄膜方面的研究。E-mail:christcxk@126.com

  • 中图分类号: O484.41

Low stress DUV optical coatings deposited by ion beam sputtering

Funds: 

Supported by National Science and Technology Major Project of China No.2009ZX02205

More Information
  • 摘要: 采用离子束溅射制备了AlF3、GdF3单层膜及193 nm减反和高反膜系,分别使用分光光度计、原子力显微镜和应力仪研究了薄膜的光学特性、微观结构以及残余应力。在优选的沉积参数下制备出消光系数分别为1.1×10-4和3.0×10-4的低损耗AlF3和GdF3薄膜,对应的折射率分别为1.43和1.67,193 nm减反膜系的透过率为99.6%,剩余反射几乎为零,而高反膜系的反射率为99.2%,透过率为0.1%。应力测量结果表明,AlF3薄膜表现为张应力而GdF3薄膜具有压应力,与沉积条件相关的低生长应力是AlF3和GdF3薄膜残余应力较小的主要原因,采用这两种材料制备的减反及高反膜系应力均低于50 MPa。针对平面和曲率半径为240 mm的凸面元件,通过设计修正挡板,250 mm口径膜厚均匀性均优于97%。为亚纳米精度的平面元件镀制193 nm减反膜系,镀膜后RMS由0.177 nm变为0.219 nm。

     

  • 图 1  离子束溅射镀膜机结构示意图

    Figure 1.  Schematic diagram of the IBS system

    图 2  AlF3与GdF3薄膜X射线衍射图

    Figure 2.  XRD patterns of AlF3 and GdF3 films

    图 3  单层膜及多层膜原子力显微镜图像

    Figure 3.  AFM images of single layers and multilayer stacks

    图 4  (a)AlF3破裂和(d)GdF3起皱的显微镜图片,(b)和(e)对应(a)和(d)几秒后的演变,(c)和(f)是具有光滑表面的AlF3和GdF3薄膜。 (a)、(b)中标线长度为136.58 μm,(c)、(f)中标线长度为100 μm

    Figure 4.  Microscopic images of cracks in (a)AlF3 and wrinkles in (d)GdF3. (b) and (e) are the evolutions of (a) and (d) a few seconds later.(c) and (f) are AlF3 and GdF3 films with smooth surfaces. The label is 136.58 μm in (a) and (b),while it is 100μm in (c) and (f)

    图 5  测量的透射和反射光谱

    Figure 5.  Measured transmittance and reflectance spectra

    图 6  无挡板和有挡板时AlF3薄膜膜厚均匀性

    Figure 6.  Thickness uniformity of AlF3 film with and without shadow mask when using flat and convex clamps

    图 7  口径为174 mm的平面表面面形

    Figure 7.  Surface figure of a 174 mm-flat substrate

    表  1  单层膜及多层膜的特征参数

    Table  1.   Parameters of AlF3, GdF3 films and multilayer coatings

    样品AlF3GdF3ARHR
    厚度/nm437.6418.593.91565.8
    光学损耗/%0.81.30.40.7
    表面粗糙度/nm0.830.270.340.31
    应力/MPa23-35-20-41
    下载: 导出CSV
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出版历程
  • 收稿日期:  2016-06-17
  • 修回日期:  2016-07-25
  • 刊出日期:  2016-12-01

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