Influence of substrate temperature on the quality of thick Al films of echelle grating
-
摘要: 大尺寸中阶梯光栅具有大孔径和极高的衍射级次，可以实现普通光栅难以达到的极高光谱分辨率。中阶梯光栅通常是利用刻划机在厚铝膜上刻划而成，所以制备大面积均匀性的高质量铝膜刻划基底是实现高性能大尺寸中阶梯光栅的关键因素。在较厚铝膜的制备工艺中，基底温度是至关重要的工艺参数。本文通过电子束热蒸发镀铝工艺在不同基底温度下制备了厚铝膜样品，并利用原子力显微镜、扫描电镜等手段从宏观和微观尺度详细分析了基底温度对铝膜质量的影响。铝膜平均晶粒尺寸从100℃时的264.34 nm增大到200℃时的384.97 nm和300℃时的596.35 nm，表面粗糙度Rq从100℃时的34.7 nm增长到200℃时的58.9 nm和300℃时的95.1 nm。结果表明，随着基底温度的升高表面粗糙度迅速增大，铝膜的表面质量严重退化。Abstract: Large-size echelle grating has extremely high spectral resolution due to its large aperture and high diffractive order. Generally, echelle grating ruling is performed on a thick Al film. Consequently, the preparation of high-quality large-area thick Al films becomes one of the most important factors to realize a high-performance large-size echelle grating. In the thick Al films deposition process, substrate temperature is the most important technological parameter. In this paper, the thick Al films samples are prepared at different temperatures by electron-beam evaporation technique. Then, the influence of substrate temperature on the Al films quality are analyzed by means of an atomic force microscope and scanning electron microscope. It is found that the average grain size and surface roughness increase rapidly from 264.34 nm, 34.7 nm at 100℃ to 384.97 nm, 58.9 nm at 200℃ and 596.35 nm, 95.1 nm at 300℃. Experimental results show that with an increased substrate temperature, grain size and surface roughness increase sharply and the surface quality of thick Al films degrades seriously.
-
Key words:
- echelle grating /
- thick Al films /
- substrate temperature
-
图 1 电子束热蒸发系统结构示意图
Figure 1. Schematic structure diagram of electron beam evaporation system
图 2 不同基底温度沉积的铝膜表面和截面SEM图
Figure 2. Top-down and cross-sectional SEM images of Al films at different substrate temperatures
图 3 不同基底温度沉积的铝膜表面AFM图
Figure 3. AFM images of Al film surfaces at different substrate temperatures
图 4 铝膜晶粒尺寸随基底温度的变化
Figure 4. Dependence of Al film grain size on the substrate temperature
-
[1] HARRISON G R. The production of diffraction gratings:Ⅱ.the design of echelle gratings and spectrographs[J]. J. Optical Society of America,1949,39(7):522-528. doi: 10.1364/JOSA.39.000522 [2] SONG J,CHEN L,LI B. A fast simulation method of silicon nanophotonic echelle gratings and its applications in the design of on-chip spectrometers[J]. Progress In Electromagnetics Research,2013,141:369-382. doi: 10.2528/PIER13052801 [3] BACH K G,BACH Jr B W. Large-ruled monolithic echelle gratings[J]. SPIE,2000,4014:118-124. http://cn.bing.com/academic/profile?id=2165514784&encoded=0&v=paper_preview&mkt=zh-cn [4] 张方程,于海利,周敬萱.大尺寸中阶梯光栅铝膜均匀性研究[J].长春工业大学学报:自然科学版,2013,34(2):195-199. http://www.cnki.com.cn/Article/CJFDTOTAL-JLGX201302015.htmZHANG F CH,YU H L,ZHOU J X. Uniformity of large size echelle grating substrate film[J]. J. Changchun University of Technology(Natural Science Edition),2013,34(2):195-199.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-JLGX201302015.htm [5] ENGMAN S,LINDBLOM P. Blaze characteristics of echelle gratings[J]. Applied Optics,1982,21(23):4356-4362. doi: 10.1364/AO.21.004356 [6] LINDBLOM P. Echelle gratings acting as one[J]. Applied Optics,2003,42(22):4549-4559. doi: 10.1364/AO.42.004549 [7] 朱文煜,陈少杰,撖芃芃,等.分波段式中阶梯光栅原子发射光谱仪[J].光学精密工程,2014,22(4):870-876. doi: 10.3788/OPE.ZHU W Y,CHEN SH J,HAN P P,et al.. Echelle-emission spectrometer with divided spectral coverage[J]. Opt. Precision Eng.,2014,22(4):870-876.(in Chinese) doi: 10.3788/OPE. [8] 唐玉国,宋楠,巴音,等.中阶梯光栅光谱仪的光学设计[J].光学精密工程,2010,18(9):1989. http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201009013.htmTANG Y G,SONG N,BA Y,et al.. Optical design of cross-dispersed spectrograph[J]. Opt. Precision Eng.,2010,18(9):1989.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201009013.htm [9] 唐玉国,陈少杰,巴音,等.中阶梯光栅光谱仪的谱图还原与波长标定[J].光学精密工程,2010,18(10):2130-2135. http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201010003.htmTANG Y G,CHEN SH J,BA Y,et al.. Spectral reducing of cross-dispersed echelle spectrograph and its wavelength calibration[J]. Opt. Precision Eng.,2010,18(10):2130-2135.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201010003.htm [10] BAMARD T W,CROCKETT M I,IVALDI J C,et al.. Design and evaluation of an echelle grating optical system for ICP-OES[J]. Analytical Chemistry,1993,65(9):1225-1230. doi: 10.1021/ac00057a020 [11] NEVEJANS D,NEEFS E,VAN RANSBEECK E,et al.. Compact high-resolution spaceborne echelle grating spectrometer with acousto-optical tunable filter based order sorting for the infrared domain from 2.2 to 4.3μm[J]. Applied Optics,2006,45(21):5191-5206. doi: 10.1364/AO.45.005191 [12] HARRISON G R,THOMPSON S W,KAZUKONIS H,et al.. 750-mm ruling engine producing large gratings and echelles[J]. JOSA,1972,62(6):751-756. doi: 10.1364/JOSA.62.000751 [13] 李资政,杨海贵,王笑夷,等.具有大面积均匀性,高质量的大尺寸中阶梯光栅铝膜的研究[J].物理学报,2014,63(15):157801-157801. http://www.cnki.com.cn/Article/CJFDTOTAL-WLXB201415056.htmLI Z ZH,YANG H G,WANG X Y,et al.. Investigations of high-quality aluminum film with large-area uniformity for large-size echelle grating[J]. Acta Phys. Sin.,2014,63(15):157801-157801.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-WLXB201415056.htm [14] LEE H M,CHOI S Y,JUNG A. Direct deposition of highly conductive aluminum thin film on substrate by solution-dipping process[J]. ACS Applied Materials Interfaces,2013,5(11):4581-4585. doi: 10.1021/am400812e [15] XIONG Y Q,LI X C,CHEN Q,et al.. Characteristics and properties of metal aluminum thin films prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology[J]. Chinese Physics B,2012,21(7):078105. doi: 10.1088/1674-1056/21/7/078105 [16] BRADFORD A P,HASS G,OSANTOWSKI J F,et al.. Preparation of mirror coatings for the vacuum ultraviolet in a 2-m evaporator[J]. Applied Optics,1969,8(6):1183-1189. doi: 10.1364/AO.8.001183 [17] WILBRANDT S,STENZEL O,NAKAMURA H,et al.. Protected and enhanced aluminum mirrors for the VUV[J]. Applied Optics,2014,53(4):A125-A130. doi: 10.1364/AO.53.00A125 [18] YANG M,GATTO A,KAISER N. Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range[J]. Applied Optics,2006,45(1):178-183. doi: 10.1364/AO.45.000178 [19] SCH RMANN M,JOBST P J,YULIN S,et al.. Optical reflector coatings for astronomical applications from EUV to IR[J]. SPIE,2012:8450:84502K-8. http://cn.bing.com/academic/profile?id=2089176272&encoded=0&v=paper_preview&mkt=zh-cn [20] LI Z Z,GAO J S,YANG H G,et al.. Roughness reduction of large-area high-quality thick Al films for echelle gratings by multi-step deposition method[J]. Optics Express,2015,23(18):23738-23747. doi: 10.1364/OE.23.023738 [21] YANG H G,LI Z Z,WANG X Y,et al.. Radial-quality uniformity investigations of large-area thick Al films[J]. Optical Engineering,2015,54(4):045106-045106. doi: 10.1117/1.OE.54.4.045106 [22] LAI Z W,SARMA S D. Kinetic growth with surface relaxation:Continuum versus atomistic models[J]. Physical Review Letters,1991,66(18):2348. doi: 10.1103/PhysRevLett.66.2348 [23] TU K N,GUSAK A M,SOBCHENKO I. Linear rate of grain growth in thin films during deposition[J]. Physical Review B,2003,67(24):245408. doi: 10.1103/PhysRevB.67.245408 [24] SROLOVITZ D J,BATTAILE C C,LI X,et al.. Simulation of faceted film growth in two-dimensions:microstructure, morphology and texture[J]. Acta Materialia,1999,47(7):2269-2281. doi: 10.1016/S1359-6454(99)00086-5 [25] ROBBIE K,SIT J C,BRETT M J. Advanced techniques for glancing angle deposition[J]. J. Vacuum Science Technology B,1998,16(3):1115-1122. doi: 10.1116/1.590019 [26] KARABACAK T. Thin-film growth dynamics with shadowing and re-emission effects[J]. J. Nanophotonics,2011,5(1):052501-052501-18. doi: 10.1117/1.3543822 [27] CHANG J F,KUO H H,LEU I C,et al.. The effects of thickness and operation temperature on ZnO:Al thin film CO gas sensor[J]. Sensors and Actuators B:Chemical,2002,84(2):258-264. http://cn.bing.com/academic/profile?id=2025933302&encoded=0&v=paper_preview&mkt=zh-cn [28] ONISHI T,IWAMURA E,TAKAGI K. Morphology of sputter deposited Al alloy films[J]. Thin Solid Films,1999,340(1):306-316. http://cn.bing.com/academic/profile?id=2055619502&encoded=0&v=paper_preview&mkt=zh-cn [29] HWANG S J,LEE J H,JEONG C O,et al.. Effect of film thickness and annealing temperature on hillock distributions in pure Al films[J]. Scripta Materialia,2007,56(1):17-20. doi: 10.1016/j.scriptamat.2006.09.001 -
下载:
图(5)
计量
- 文章访问数: 1659
- HTML全文浏览量: 350
- PDF下载量: 764
- 被引次数: 0
